Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 8/20 | 0.38 |
| ▸ | CA2 | P00918 | 8/20 | 0.38 |
| ▸ | MMP1 | P03956 | 4/20 | 0.38 |
| ▸ | MMP2 | P08253 | 4/20 | 0.38 |
| ▸ | MMP9 | P14780 | 4/20 | 0.38 |
| ▸ | MMP8 | P22894 | 4/20 | 0.38 |
| ▸ | MMP13 | P45452 | 4/20 | 0.38 |
| ▸ | CES1 | P23141 | 2/20 | 0.38 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.34 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.33 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.33 |
| ▸ | RORC | P51449 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | KAT6A | Q92794 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL455255 | 0.86 | CES1 (0.44) | CA1CA2CES1PTPN1LMNA | |
| SCHEMBL11579454 | 0.79 | CES1 (0.42) | CES1PTPN1LMNAMAPTHSD11B1 | |
| SCHEMBL5913016 | 0.78 | CES1 (0.45) | CES1PTPN1MAPTKAT6A | |
| SCHEMBL21874985 | 0.75 | CES1 (0.39) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL452943 | 0.75 | KMT2A (0.38) | CES1RORCKAT6AHSD11B1 | |
| SCHEMBL7945147 | 0.74 | CES1 (0.49) | CES1PTPN1LMNAMAPT | |
| SCHEMBL1346042 | 0.73 | CA1 (0.39) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL504243 | 0.72 | RECQL (0.45) | CES1LMNAMAPTNPSR1HSD11B1 | |
| SCHEMBL36097 | 0.71 | CES1 (0.59) | CES1LMNANPSR1 | |
| SCHEMBL5574740 | 0.70 | CES1 (0.49) | CES1LMNAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3010943-B1 | CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM | CANON KK (JP) | 2024-04-03 | — | — | EP | disclosed |
| US-11332597-B2 | Photo-curable composition and patterning method using the same | CANON KABUSHIKI KAISHA (JP) | 2022-05-17 | — | — | US | disclosed |
| EP-2841255-B1 | RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS | CANON KK (JP) | 2020-05-13 | — | — | EP | disclosed |
| US-20200123343-A1 | PHOTO-CURABLE COMPOSITION AND PATTERNING METHOD USING THE SAME | CANON KK (JP) | 2020-04-23 | — | — | US | disclosed |
| US-10472445-B2 | Photocurable composition and method for manufacturing film | CANON KABUSHIKI KAISHA (JP) | 2019-11-12 | — | — | US | disclosed |
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | CANON KABUSHIKI KAISHA (JP) | 2019-09-24 | — | — | US | disclosed |
| EP-2907156-B1 | IMPRINTING METHOD AND CURABLE COMPOSITION FOR IMPRINTING | CANON KK (JP) | 2019-04-10 | — | — | EP | disclosed |
| US-10233274-B2 | Curable composition and patterning method using the same | CANON KABUSHIKI KAISHA (JP) | 2019-03-19 | — | — | US | disclosed |
| US-10208183-B2 | Curable composition, film, and method of producing film | CANON KABUSHIKI KAISHA (JP) | 2019-02-19 | — | — | US | disclosed |
| EP-2760894-B1 | PHOTO-CURABLE COMPOSITION AND PATTERNING METHOD USING THE SAME | CANON KK (JP) | 2018-12-12 | — | — | EP | disclosed |
| EP-2372405-A1 | Lens and method for producing lens | Canon Kabushiki Kaisha (JP) | 2011-10-05 | — | — | EP | disclosed |
| WO-2011027845-A1 | MANUFACTURING METHOD FOR PLASTIC MEMBER AND PLASTIC MEMBER | CANON KABUSHIKI KAISHA (JP) | 2011-03-10 | — | — | WO | disclosed |
| US-20100273109-A1 | METHOD FOR PRODUCING OPTICAL PART | CANON KABUSHIKI KAISHA (JP) | 2010-10-28 | — | — | US | disclosed |
| EP-2243622-A2 | Method for producing optical part | CANON KABUSHIKI KAISHA (JP) | 2010-10-27 | — | — | EP | disclosed |
| US-20070275327-A1 | PHOTOSENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMING METHOD, SUBSTRATE PROCESSING METHOD, AND DEVICE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2007-11-29 | — | — | US | disclosed |
| EP-1011029-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-08-30 | — | — | EP | disclosed |
| US-20050221222-A1 | Photosensitive resin composition, resist pattern forming method, substrate processing method, and device manufacturing method | CANON KABUSHIKI KAISHA (JP) | 2005-10-06 | — | — | US | disclosed |
| US-6337171-B1 | AS A RESIST APPLICABLE TO FAR ULTRAVIOLET RAYS SUCH AS A KRF EXCIMER LASER, CHARGED PARTICLE RAYS SUCH AS ELECTRON BEAMS, AND X-RAYS | JSR CORPORATION (JP) | 2002-01-08 | — | — | US | disclosed |
| US-6280900-B1 | RADIATION SENSITIVE COMPOSITION WITH ALKALINE DEVELOPER SOLUBLE IN POLYMER COATED ON SUBSTRATE | JSR CORPORATION (JP) | 2001-08-28 | — | — | US | disclosed |
| EP-1011029-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2000-06-21 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | PFN1, PFAS, FRG1 | CA1 3547/4885CA2 1047/4885MMP1 4525/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.