Known targets — ChEMBL curated mechanism
ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2171735 | 1.00 | — | — | |
| SCHEMBL8826051 | 1.00 | — | — | |
| SCHEMBL177705 | 0.94 | — | — | |
| SCHEMBL3948431 | 0.94 | — | — | |
| SCHEMBL349339 | 0.94 | — | — | |
| SCHEMBL9067887 | 0.94 | — | — | |
| SCHEMBL49117 | 0.94 | — | — | |
| Water SCHEMBL441737 | 0.88 | — | — | |
| Water SCHEMBL4625510 | 0.88 | — | — | |
| Water SCHEMBL11057188 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0045826-A1 | Dicalcium phosphate dihydrate having improved stability and a method for preparing it | MONSANTO COMPANY (US) | 1982-02-17 | — | — | EP | claimed |
| US-4247526-A | Method for preparing dicalcium phosphate dihydrate with improved stability | MONSANTO COMPANY (US) | 1981-01-27 | — | — | US | claimed |
| US-20200165450-A1 | CHEMICALLY RESISTANT THERMOPLASTIC COMPOSITIONS | DSM IP ASSETS BV (NL) | 2020-05-28 | — | — | US | disclosed |
| US-10597534-B2 | Chemically resistant thermoplastic compositions | DSM IP ASSETS B.V. (NL) | 2020-03-24 | — | — | US | disclosed |
| EP-1846506-B2 | HEAT STABILIZED MOULDING COMPOSITION | DSM IP ASSETS BV (NL) | 2018-02-21 | — | — | EP | disclosed |
| US-20170298225-A1 | CHEMICALLY RESISTANT THERMOPLASTIC COMPOSITIONS | DSM IP ASSETS B.V. (NL) | 2017-10-19 | — | — | US | disclosed |
| EP-3201273-A1 | CHEMICALLY RESISTANT THERMOPLASTIC COMPOSITIONS | DSM IP Assets B.V. (NL) | 2017-08-09 | — | — | EP | disclosed |
| CN-106795370-A | The thermoplastic compounds of chemically-resistant | 帝斯曼知识产权资产管理有限公司 | 2017-05-31 | — | — | CN | disclosed |
| WO-2016050743-A1 | CHEMICALLY RESISTANT THERMOPLASTIC COMPOSITIONS | DSM IP ASSETS B.V. (NL) | 2016-04-07 | — | — | WO | disclosed |
| US-8969460-B2 | Heat stabilized moulding composition | DSM IP ASSETS B.V. (NL) | 2015-03-03 | — | — | US | disclosed |
| US-20140275385-A1 | HEAT STABILIZED MOULDING COMPOSITION | DSM IP ASSETS B.V. (NL) | 2014-09-18 | — | — | US | disclosed |
| US-20080146717-A1 | heat resistant blends of thermoplastic polyamides, stabilizer agents and metal oxides, having tensile strength for use in automobile engines, machines, or electrical and electronic apparatus | DSM IP ASSETS B.V. (NL) | 2008-06-19 | — | — | US | disclosed |
| EP-1846506-B1 | HEAT STABILIZED MOULDING COMPOSITION | DSM IP ASSETS BV (NL) | 2008-06-04 | — | — | EP | disclosed |
| EP-1846506-A1 | HEAT STABILIZED MOULDING COMPOSITION | DSMIP Assets B.V. (NL) | 2007-10-24 | — | — | EP | disclosed |
| WO-2006074934-A1 | HEAT STABILIZED MOULDING COMPOSITION | DSM IP ASSETS B.V. (NL) | 2006-07-20 | — | — | WO | disclosed |
| EP-1681313-A1 | Heat stabilized moulding composition | DSM IP Assets B.V. (NL) | 2006-07-19 | — | — | EP | disclosed |
| EP-0518352-B1 | Process for forming super high-contrast negative images and silver halide photographic material and developer being used therefor | DAINIPPON INK & CHEMICALS (JP) | 1998-04-22 | — | — | EP | disclosed |
| US-5460919-A | Process of forming super high-contrast negative images and silver halide photographic material and developer being used therefor | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1995-10-24 | — | — | US | disclosed |
| US-5372911-A | Support having one or more hydrophilic colloidal layers, at least one layer contains pyridinium salt or derivative, quinolinium salt or derivative, or isoquinolinium salt or derivative | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1994-12-13 | — | — | US | disclosed |
| EP-0518352-A1 | Process for forming super high-contrast negative images and silver halide photographic material and developer being used therefor | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1992-12-16 | — | — | EP | disclosed |