Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2A | P28223 | 1/20 | 0.34 |
| ▸ | HTR2C | P28335 | 1/20 | 0.34 |
| ▸ | HTR2B | P41595 | 1/20 | 0.34 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.31 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6893123 | 0.85 | HTR2A (0.33) | HTR2AHTR2CHTR2B | |
| SCHEMBL6885604 | 0.84 | HTR2A (0.32) | HTR2AHTR2CHTR2B | |
| SCHEMBL6892427 | 0.81 | DHODH (0.33) | — | |
| SCHEMBL6892978 | 0.81 | POLB (0.32) | — | |
| SCHEMBL3672559 | 0.81 | PPARG (0.31) | HTR2AHTR2CHTR2B | |
| SCHEMBL6894291 | 0.79 | GRIN2D (0.34) | — | |
| SCHEMBL66086 | 0.78 | CYP1A2 (0.39) | — | |
| SCHEMBL11863358 | 0.77 | CYP2A6 (0.32) | — | |
| SCHEMBL3407567 | 0.76 | HIF1A (0.34) | — | |
| SCHEMBL258245 | 0.74 | KDM4E (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 193 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240241442-A1 | Positive Resist Material And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-18 | — | — | US | disclosed |
| US-20240210830-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| US-12013639-B2 | Positive resist material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-18 | — | — | US | disclosed |
| US-20240192591-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-13 | — | — | US | disclosed |
| US-20240184200-A1 | AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-06 | — | — | US | disclosed |
| US-20240184199-A1 | Onium Salt, Resist Composition, And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-06 | — | — | US | disclosed |
| US-12001139-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-04 | — | — | US | disclosed |
| CN-118112887-A | Resist composition and pattern forming method | 信越化学工业株式会社 | 2024-05-31 | — | — | CN | disclosed |
| US-20240176238-A1 | SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-30 | — | — | US | disclosed |
| US-20240176235-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-30 | — | — | US | disclosed |
| EP-1023282-A1 | NOVEL PHARMACEUTICALLY ACTIVE COMPOUNDS, THEIR PREPARATION AND USE AS ECE-INHIBITORS | BASF AKTIENGESELLSCHAFT (DE) | 2000-08-02 | — | — | EP | disclosed |
| EP-0997534-A2 | Process for the resolution of racemic arylalkylcarboxylic acid esters | BASF AKTIENGESELLSCHAFT (DE) | 2000-05-03 | — | — | EP | disclosed |
| EP-0988291-A1 | METHOD FOR PRODUCING QUINAZOLINE-DIONES IN SOLID PHASE AND USE OF THE SAME | BASF AKTIENGESELLSCHAFT (DE) | 2000-03-29 | — | — | EP | disclosed |
| WO-2000002928-A1 | METHOD FOR THE STEREOSELECTIVE PRODUCTION OF GRIGNARD COMPOUNDS AND USE THEREOF | BASF AKTIENGESELLSCHAFT (DE) | 2000-01-20 | — | — | WO | disclosed |
| WO-1999051609-A1 | METHOD FOR PRODUCING GRIGNARD COMPOUNDS | BASF AKTIENGESELLSCHAFT (DE) | 1999-10-14 | — | — | WO | disclosed |
| WO-1999019320-A1 | NOVEL PHARMACEUTICALLY ACTIVE COMPOUNDS, THEIR PREPARATION AND USE AS ECE-INHIBITORS | BASF AKTIENGESELLSCHAFT (DE) | 1999-04-22 | — | — | WO | disclosed |
| WO-1999019346-A1 | DIPEPTIDES FOR THE TREATMENT OF DISEASES RELATED TO THE BIOLOGICAL EFFECT OF ENDOTHELIN | BASF AKTIENGESELLSCHAFT (DE) | 1999-04-22 | — | — | WO | disclosed |
| EP-0888262-A1 | CYCLOALKYL DERIVATIVES AND THE SOLID-PHASE SYNTHESIS OF SUCH DERIVATIVES | BASF AKTIENGESELLSCHAFT (DE) | 1999-01-07 | — | — | EP | disclosed |
| WO-1998056770-A1 | METHOD FOR PRODUCING QUINAZOLINE-DIONES IN SOLID PHASE AND USE OF THE SAME | BASF AKTIENGESELLSCHAFT (DE) | 1998-12-17 | — | — | WO | disclosed |
| WO-1997034852-A1 | CYCLOALKYL DERIVATIVES AND THE SOLID-PHASE SYNTHESIS OF SUCH DERIVATIVES | BASF AKTIENGESELLSCHAFT (DE) | 1997-09-25 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240184199-A1 | Onium Salt, Resist Composition, And Patterning Process | LBR, ZYX, SCN1B | HTR2A 4308/4885HTR2C 4580/4885HTR2B 2888/4885 |
| US-20240176238-A1 | SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS | SLC6A5, HNRNPU, SLC6A9 | HTR2A 3133/4885HTR2C 3670/4885HTR2B 3151/4885 |
| US-20240184200-A1 | AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | ADAR, HNRNPU, POLQ | HTR2A 361/4885HTR2C 602/4885HTR2B 736/4885 |
| US-12001139-B2 | Resist composition and patterning process | HNRNPU, HNRNPR, FGR | HTR2A 3247/4885HTR2C 3586/4885HTR2B 3220/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.