SCHEMBL4648468

SCHEMBL4648468

c1cc(-c2ccc(COCC3CS3)cc2)ccc1COCC1CS1

nearest known ligand 0.43

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 3/20 0.43
IDO1 P14902 2/20 0.35
AGXT P21549 2/20 0.35
TSHR P16473 1/20 0.33
TAAR1 Q96RJ0 1/20 0.32
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1402763 0.94 TSHR (0.37) NAAATSHRTAAR1LMNA
SCHEMBL4647770 0.88 LTA4H (0.37) NAAATSHRTAAR1LMNA
SCHEMBL2734450 0.84 TSHR (0.54) NAAAIDO1AGXTTSHRTAAR1
SCHEMBL4647642 0.83 LMNA (0.33) NAAATSHRLMNA
SCHEMBL15794308 0.82 IDO1 (0.47) IDO1AGXT
SCHEMBL27716350 0.81 NAAA (0.32) NAAATSHRTAAR1LMNA
SCHEMBL4646518 0.80 MMP2 (0.41) LMNA
SCHEMBL4649028 0.80 HPGD (0.38) NAAAIDO1TSHR
SCHEMBL1402494 0.78 TSHR (0.37) IDO1AGXTTSHRTAAR1LMNA
SCHEMBL1402838 0.73 CHRNB2 (0.35) IDO1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080206668-A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
EP-1962139-A1 Negative resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-08-27 EP disclosed