Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 1/20 | 0.37 |
| ▸ | ESR1 | P03372 | 1/20 | 0.34 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | NAAA | Q02083 | 1/20 | 0.33 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | BCHE | P06276 | 1/20 | 0.31 |
| ▸ | ACHE | P22303 | 1/20 | 0.31 |
| ▸ | MMP2 | P08253 | 1/20 | 0.30 |
| ▸ | MMP9 | P14780 | 1/20 | 0.30 |
| ▸ | MMP8 | P22894 | 1/20 | 0.30 |
| ▸ | MMP14 | P50281 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1402763 | 0.94 | TSHR (0.37) | TSHRNAAATAAR1LMNABCHE | |
| SCHEMBL4648468 | 0.88 | NAAA (0.43) | TSHRNAAATAAR1LMNA | |
| SCHEMBL2734450 | 0.84 | TSHR (0.54) | TSHRNAAATAAR1LMNABCHE | |
| SCHEMBL15794308 | 0.82 | IDO1 (0.47) | — | |
| SCHEMBL4649028 | 0.80 | HPGD (0.38) | ESR1ESR2TSHRNAAA | |
| SCHEMBL4646518 | 0.80 | MMP2 (0.41) | LMNAMMP2MMP9MMP8MMP14 | |
| SCHEMBL1402494 | 0.78 | TSHR (0.37) | TSHRTAAR1LMNABCHEACHE | |
| SCHEMBL1402613 | 0.76 | LTA4H (0.44) | LTA4H | |
| SCHEMBL1402838 | 0.73 | CHRNB2 (0.35) | TSHRMMP2MMP9MMP8MMP14 | |
| SCHEMBL12172323 | 0.72 | MGLL (0.47) | LTA4HTSHRTAAR1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |