SCHEMBL465377

SCHEMBL465377

CCCC(O)N(CC)C(O)CCC

nearest known ligand 0.33

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.33
LMNA P02545 1/20 0.33
CHRM1 P11229 1/20 0.32
AKR1A1 P14550 1/20 0.32
CHRM3 P20309 1/20 0.32
HTR2A P28223 1/20 0.32
HTR2C P28335 1/20 0.32
ADRA1A P35348 1/20 0.32
HRH1 P35367 1/20 0.32
DRD3 P35462 1/20 0.32
SLC6A3 Q01959 1/20 0.32
HDAC1 Q13547 1/20 0.32
HDAC2 Q92769 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
AOC3 Q16853 1/20 0.31
CYP3A4 P08684 1/20 0.31
NFKB1 P19838 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
FDPS P14324 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5052254 0.92 LMNA (0.34) TSHRLMNAAOC3
SCHEMBL5052378 0.87 TSHR (0.35) TSHRLMNA
SCHEMBL9950917 0.87 LMNA (0.30) LMNA
SCHEMBL9949303 0.85 LMNA (0.33) LMNA
SCHEMBL9949060 0.85 TSHR (0.33) TSHR
SCHEMBL465470 0.83 ALDH1A1 (0.37) LMNATDP1FDPS
SCHEMBL9950198 0.83 TSHR (0.33) TSHRLMNA
SCHEMBL9949051 0.83 LMNA (0.32) LMNA
SCHEMBL28257130 0.82 TSHR (0.33) TSHRLMNACHRM1AKR1A1CHRM3
SCHEMBL465359 0.81 GPR84 (0.41) LMNACYP3A4FDPS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 128 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10113049-B2 Thermoplastic resin composition NIPPON NYUKAZAI CO., LTD. (JP) 2018-10-30 US claimed
US-20150329698-A1 THERMOPLASTIC RESIN COMPOSITION NIPPON NYUKAZAI CO., LTD. (JP) 2015-11-19 US claimed
US-20080066644-A1 Alkylmines, alkanolamine compounds, surfactants, a coloring agent and a solvent; combination results in decreased kogation SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-03-20 US claimed
EP-1900785-A1 Ink Composition for Inkjet Recording Samsung Electronics Co., Ltd. (KR) 2008-03-19 EP claimed
CN-109789065-B Cosmetic composition for combating colour loss of dyed material 因诺斯佩克有限公司 2023-11-21 CN disclosed
CN-109890360-B Methods, compositions and uses related thereto 因诺斯佩克有限公司 2023-11-21 CN disclosed
CN-109789064-B Methods, compositions and uses related thereto 因诺斯佩克有限公司 2023-11-21 CN disclosed
CN-109789319-B Reduction of color loss from dyed materials by using amine salts of carboxylic acids 因诺斯佩克有限公司 2023-09-29 CN disclosed
EP-3518874-B1 METHODS, COMPOSITIONS AND USES RELATING THERETO INNOSPEC LTD (GB) 2023-08-16 EP disclosed
WO-2023131780-A1 CORROSION INHIBITOR INNOSPEC LIMITED (GB) 2023-07-13 WO disclosed
CN-114149302-B Preparation method of 2,2,3,3,3-pentafluoropropanol 湖北孚诺林新材料有限公司 2022-12-09 CN disclosed
US-11311471-B2 Methods, compositions and uses relating thereto INNOSPEC LIMITED (GB) 2022-04-26 US disclosed
US-6413647-B1 USEFUL AS INTERLAYER DIELECTRIC FILM IN SEMICONDUCTOR DEVICES; MECHANICAL STRENGTH JSR CORPORATION (JP) 2002-07-02 US disclosed
US-6410151-B1 Composition for film formation, method of film formation, and insulating film JSR CORPORATION (JP) 2002-06-25 US disclosed
US-6410150-B1 Composition for film formation, method of film formation, and insulating film JSR CORPORATION (JP) 2002-06-25 US disclosed
US-20010018129-A1 Process for producing silica-based film, silica-based film, insulating film, and semiconductor device JSR CORPORATION (JP) 2001-08-30 US disclosed
EP-1127929-A2 Composition for film formation, method of film formation, and silica-based film JSR Corporation (JP) 2001-08-29 EP disclosed
EP-1122770-A2 Silica-based insulating film and its manufacture JSR Corporation (JP) 2001-08-08 EP disclosed
EP-1090967-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-11 EP disclosed
EP-1088868-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-04 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11311471-B2 Methods, compositions and uses relating thereto LPO, AOC1, HAO2 TSHR 4576/4885LMNA 501/4885CHRM1 1869/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.