SCHEMBL4655810

SCHEMBL4655810

COc1ccc([I+](OS(=O)(=O)c2ccc(C(F)(F)F)cc2)c2ccccc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NOX4 Q9NPH5 2/20 0.47
AHR P35869 1/20 0.43
GAA P10253 1/20 0.42
KMT2A Q03164 1/20 0.42
HSD11B1 P28845 1/20 0.42
L3MBTL1 Q9Y468 2/20 0.41
LMNA P02545 1/20 0.41
HTT P42858 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
TP53 P04637 1/20 0.40
ALDH1A1 P00352 1/20 0.40
BMP1 P13497 1/20 0.39
AR P10275 1/20 0.39
TUBB4A P04350 1/20 0.39
TUBB P07437 1/20 0.39
TUBA3C P0DPH7 1/20 0.39
TUBA1B P68363 1/20 0.39
TUBA4A P68366 1/20 0.39
TUBB4B P68371 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547538 0.89 PTGS2 (0.41) HSD11B1L3MBTL1ALDH1A1ARENPP3
SCHEMBL2634850 0.88 LMNA (0.50) GAAL3MBTL1LMNAHTTSMN1; SMN2
SCHEMBL4655792 0.86 HTT (0.45) GAAHSD11B1L3MBTL1LMNAHTT
SCHEMBL547561 0.86 HSD11B1 (0.43) KMT2AHSD11B1ALDH1A1AR
SCHEMBL1804287 0.85 KIF11 (0.44) NOX4KMT2AENPP3ENPP1
SCHEMBL760069 0.84 ALDH1A1 (0.46) GAAL3MBTL1LMNAHTTSMN1; SMN2
SCHEMBL5699308 0.82 HSD11B1 (0.47) KMT2AHSD11B1L3MBTL1LMNAHTT
SCHEMBL2902863 0.81 ALDH1A1 (0.47) NOX4GAAKMT2AHSD11B1TDP1
SCHEMBL548082 0.81 ALDH1A1 (0.47) NOX4GAAKMT2AHSD11B1TDP1
SCHEMBL503481 0.81 ALDH1A1 (0.42) NOX4GAAKMT2AHSD11B1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1640804-B1 Positive-tone radiation-sensitive resin composition JSR CORP (JP) 2008-11-19 EP disclosed
US-7335457-B2 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2008-02-26 US disclosed
US-7258962-B2 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2007-08-21 US disclosed
US-20060078821-A1 A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication JSR CORPORATION (JP) 2006-04-13 US disclosed
EP-1640804-A2 Positive-tone radiation-sensitive resin composition JSR Corporation (JP) 2006-03-29 EP disclosed
US-20050244747-A1 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2005-11-03 US disclosed