SCHEMBL4655792

SCHEMBL4655792

COc1ccc([I+](OS(=O)(=O)c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 3/20 0.45
L3MBTL1 Q9Y468 2/20 0.45
TDP1 Q9NUW8 2/20 0.45
LMNA P02545 1/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
ALDH1A1 P00352 3/20 0.44
HSD11B1 P28845 1/20 0.43
PKM P14618 1/20 0.43
TUBB4A P04350 1/20 0.42
TUBB P07437 1/20 0.42
TUBA3C P0DPH7 1/20 0.42
TUBA1B P68363 1/20 0.42
TUBA4A P68366 1/20 0.42
TUBB4B P68371 1/20 0.42
TUBB3 Q13509 1/20 0.42
TUBB2A Q13885 1/20 0.42
TUBB8 Q3ZCM7 1/20 0.42
TUBA3E Q6PEY2 1/20 0.42
TUBA1A Q71U36 1/20 0.42
TUBA1C Q9BQE3 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2634850 0.95 LMNA (0.50) HTTL3MBTL1TDP1LMNASMN1; SMN2
SCHEMBL760069 0.91 ALDH1A1 (0.46) HTTL3MBTL1TDP1LMNASMN1; SMN2
SCHEMBL7739970 0.87 MMP13 (0.43) HTTL3MBTL1TDP1LMNASMN1; SMN2
SCHEMBL7741652 0.87 LTA4H (0.55) HTTL3MBTL1TDP1LMNASMN1; SMN2
SCHEMBL4655810 0.86 NOX4 (0.47) HTTL3MBTL1TDP1LMNASMN1; SMN2
SCHEMBL454458 0.86 HTR6 (0.42) HTTTDP1LMNASMN1; SMN2ALDH1A1
SCHEMBL244142 0.84 ALDH1A1 (0.50) LMNAALDH1A1PKMEGFR
SCHEMBL7574614 0.83 CA4 (0.43) HTTLMNAALDH1A1HSD11B1PKM
SCHEMBL2901030 0.82 CA12 (0.39) HTTL3MBTL1TDP1LMNASMN1; SMN2
SCHEMBL2895875 0.81 VDR (0.42) HTTL3MBTL1TDP1LMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1640804-B1 Positive-tone radiation-sensitive resin composition JSR CORP (JP) 2008-11-19 EP disclosed
US-7335457-B2 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2008-02-26 US disclosed
US-7258962-B2 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2007-08-21 US disclosed
US-20060078821-A1 A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication JSR CORPORATION (JP) 2006-04-13 US disclosed
EP-1640804-A2 Positive-tone radiation-sensitive resin composition JSR Corporation (JP) 2006-03-29 EP disclosed
US-20050244747-A1 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2005-11-03 US disclosed