SCHEMBL465692

SCHEMBL465692

c1ccc(C[Te]c2ccccc2)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.59
CA2 P00918 3/20 0.59
CA7 P43166 3/20 0.59
CA4 P22748 2/20 0.59
CA9 Q16790 2/20 0.59
MAOA P21397 1/20 0.43
CALM1 P0DP23 1/20 0.43
IDO1 P14902 3/20 0.40
THRB P10828 1/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
TSHR P16473 3/20 0.39
ALDH1A1 P00352 2/20 0.39
TP53 P04637 1/20 0.39
LOXL2 Q9Y4K0 1/20 0.39
TRPA1 O75762 1/20 0.39
CYP3A4 P08684 2/20 0.39
MAPT P10636 2/20 0.39
KDM4E B2RXH2 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23293697 0.84 CA1 (0.46) CA1CA2CA7CA4CA9
SCHEMBL465768 0.74 ALDH1A1 (0.46) CA1CA2MAOACALM1IDO1
SCHEMBL9400817 0.73 ALDH1A1 (0.50) MAOACALM1IDO1TDP1TSHR
SCHEMBL29702980 0.73 CALM1 (0.50) CALM1IDO1THRBTDP1TSHR
SCHEMBL9517402 0.73 MAOA (0.48) CA1CA2CA7CA4CA9
Bromide SCHEMBL11513184 0.71 ALDH1A1 (0.48) MAOACALM1IDO1TDP1TSHR
Iodide SCHEMBL11594153 0.71 ALDH1A1 (0.48) MAOACALM1IDO1TDP1TSHR
SCHEMBL31344175 0.70 SIGMAR1 (0.46) MAOAIDO1ALDH1A1MAOBHPGD
SCHEMBL9517408 0.69 MAOB (0.46) CALM1IDO1THRBTDP1TSHR
SCHEMBL11574331 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103571357-B Protective film and its manufacturing method 琳得科株式会社 2019-04-12 CN disclosed
US-10131824-B2 Adhesive composition, adhesive sheet, and method for producing semiconductor device LINTEC CORPORATION (JP) 2018-11-20 US disclosed
EP-2821817-B1 LAMINATE SHARP KK (JP) 2018-06-20 EP disclosed
US-9862167-B2 Laminate including antireflective moth-eye film and protection film SHARP KABUSHIKI KAISHA (JP) 2018-01-09 US disclosed
CN-105358647-B The manufacture method of adhesive composite, adhesive sheet and semiconductor device 琳得科株式会社 2017-10-24 CN disclosed
CN-103571358-B Diaphragm 琳得科株式会社 2017-09-15 CN disclosed
US-20160160094-A1 Adhesive Composition, Adhesive Sheet, and Method for Producing Semiconductor Device LINTEC CORPORATION (JP) 2016-06-09 US disclosed
EP-2345679-B1 METHOD FOR PRODUCING GRAFT COPOLYMER, GRAFT COPOLYMER OBTAINED BY THE METHOD, RUBBER COMPOSITION CONTAINING THE GRAFT COPOLYMER, AND TIRE BRIDGESTONE CORP (JP) 2016-04-27 EP disclosed
CN-105358647-A Adhesive composition, adhesive sheet, and method for producing semiconductor device LINTEC CORP 2016-02-24 CN disclosed
CN-102533169-B The optics of acrylic pressure-sensitive adhesive compositions, acrylic adhesives and band binder layer LINTEC CORP. (JP) 2015-07-29 CN disclosed
US-20070073015-A1 Polymer, a method for producing the polymer, and a cement admixture using the same NIPPON SHOKUBAI CO., LTD. (JP) 2007-03-29 US disclosed
EP-1767564-A2 Polymer, a method for producing the polymer, and a cement admixture using the same NIPPON SHOKUBAI CO., LTD. (JP) 2007-03-28 EP disclosed
US-20060199927-A1 Process for production of living-radical polymers and polymers Outdoor Wireless Networks LLC 2006-09-07 US disclosed
US-20060167199-A1 Process for produciton of living radical polymers and polymers OTSUKA CHEMICAL CO., LTD. (JP) 2006-07-27 US disclosed
US-20060135711-A1 Process for the production of living radical polymers and polymers OTSUKA CHEMICAL CO., LTD. (JP) 2006-06-22 US disclosed
EP-1619211-A1 PROCESS FOR PRODUCTION OF LIVING-RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2006-01-25 EP disclosed
EP-1595894-A1 PROCESS FOR THE PRODUCTION OF LIVING RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2005-11-16 EP disclosed
US-20050245714-A1 Organic tellurium compound, process for producing the same, living radical polymerization initiator, process for producing polymer with the same, and polymer OTSUKA CHEMICAL CO., LTD. (JP) 2005-11-03 US disclosed
EP-1541550-A1 ORGANIC TELLURIUM COMPOUND, PROCESS FOR PRODUCING THE SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER WITH THE SAME, AND POLYMER Otsuka Chemical Co., Ltd. (JP) 2005-06-15 EP disclosed
EP-1541592-A1 PROCESS FOR PRODUCTION OF LIVING RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2005-06-15 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050245714-A1 Organic tellurium compound, process for producing the same, living radical polymerization initiator, process for producing polymer with the same, and polymer ODC1, TERB1, TTI1 CA1 1190/4885CA2 1325/4885CA7 577/4885
US-20060135711-A1 Process for the production of living radical polymers and polymers CBR3, CBR1, CCNT1 CA1 3016/4885CA2 2250/4885CA7 939/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.