SCHEMBL472086

SCHEMBL472086

CC1(C(=O)OCc2ccccc2)CC=CCC1

nearest known ligand 0.46

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.46
DDB1 Q16531 1/20 0.46
CRBN Q96SW2 1/20 0.46
MAPK1 P28482 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
SLC6A2 P23975 1/20 0.41
SLC6A3 Q01959 1/20 0.41
KMT2A Q03164 1/20 0.41
TDP1 Q9NUW8 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18692576 0.80 ALDH1A1 (0.53) ALDH1A1DDB1CRBNMAPK1L3MBTL1
SCHEMBL12621202 0.80 ALDH1A1 (0.53) ALDH1A1DDB1CRBNMAPK1L3MBTL1
SCHEMBL20221555 0.79 ALDH1A1 (0.51) ALDH1A1DDB1CRBN
SCHEMBL16700808 0.78 ALDH1A1 (0.50) ALDH1A1DDB1CRBNMAPK1L3MBTL1
SCHEMBL19176803 0.77 ALDH1A1 (0.50) ALDH1A1DDB1CRBNKMT2A
SCHEMBL4765037 0.77 DDB1 (0.46) ALDH1A1DDB1CRBNMAPK1L3MBTL1
SCHEMBL24425844 0.77 ALDH1A1 (0.55) ALDH1A1DDB1CRBNMAPK1L3MBTL1
SCHEMBL472143 0.77 BRD4 (0.39) KMT2A
SCHEMBL1665063 0.77 ALDH1A1 (0.43) ALDH1A1DDB1CRBNMAPK1L3MBTL1
SCHEMBL5213485 0.77 DDB1 (0.51) ALDH1A1DDB1CRBN

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8664414-B2 Process for producing epoxy compound SHOWA DENKO K.K. (JP) 2014-03-04 US disclosed
US-8466303-B2 Process for production of epoxy compound SHOWA DENKO K.K. (JP) 2013-06-18 US disclosed
US-20120029217-A1 PROCESS FOR PRODUCING EPOXY COMPOUND SHOWA DENKO K.K. (JP) 2012-02-02 US disclosed
EP-2412712-A1 METHOD FOR PRODUCING EPOXY COMPOUND Showa Denko K.K. (JP) 2012-02-01 EP disclosed
US-20110009652-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND SHOWA DENKO KK (JP) 2011-01-13 US disclosed
EP-2261219-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND Showa Denko K.K. (JP) 2010-12-15 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120029217-A1 PROCESS FOR PRODUCING EPOXY COMPOUND NOX4, NOX5, NOXO1 ALDH1A1 1104/4885DDB1 4404/4885CRBN 2212/4885
US-20110009652-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND DUOX2, EPX, DUOX1 ALDH1A1 680/4885DDB1 4436/4885CRBN 2715/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.