SCHEMBL472109

SCHEMBL472109

C=CCOC(=O)CC1=CCCCC1

nearest known ligand 0.41

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.41
HPGD P15428 3/20 0.39
THRB P10828 1/20 0.39
GSTP1 P09211 1/20 0.38
TAAR1 Q96RJ0 1/20 0.38
ALDH1A1 P00352 7/20 0.37
SMN1; SMN2 Q16637 3/20 0.37
CYP3A4 P08684 1/20 0.37
NPSR1 Q6W5P4 1/20 0.36
MEN1 O00255 1/20 0.36
PKM P14618 1/20 0.35
TSHR P16473 1/20 0.35
MAPT P10636 1/20 0.34
ALOX15 P16050 1/20 0.34
HSD17B10 Q99714 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10424628 0.95 CYP3A4 (0.38) KMT2AHPGDTHRBGSTP1TAAR1
SCHEMBL5137766 0.87 CYP3A4 (0.41) KMT2AHPGDALDH1A1SMN1; SMN2CYP3A4
SCHEMBL16648981 0.85 KMT2A (0.44) KMT2AHPGDTHRBTAAR1ALDH1A1
SCHEMBL8170012 0.84 GSTP1 (0.46) KMT2AHPGDTHRBGSTP1TAAR1
SCHEMBL28580465 0.81 TSHR (0.47) KMT2AHPGDTHRBTAAR1ALDH1A1
SCHEMBL4767012 0.80 KMT2A (0.40) KMT2AHPGDGSTP1TAAR1ALDH1A1
SCHEMBL472103 0.79 ALDH1A1 (0.47) KMT2AHPGDTHRBGSTP1ALDH1A1
SCHEMBL6964301 0.78 ALDH1A1 (0.40) HPGDTHRBGSTP1TAAR1ALDH1A1
SCHEMBL8693254 0.78 ALDH1A1 (0.46) KMT2AHPGDTHRBGSTP1ALDH1A1
SCHEMBL28820040 0.78 ALDH1A1 (0.46) KMT2AHPGDTHRBGSTP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8664414-B2 Process for producing epoxy compound SHOWA DENKO K.K. (JP) 2014-03-04 US disclosed
US-8466303-B2 Process for production of epoxy compound SHOWA DENKO K.K. (JP) 2013-06-18 US disclosed
US-20120029217-A1 PROCESS FOR PRODUCING EPOXY COMPOUND SHOWA DENKO K.K. (JP) 2012-02-02 US disclosed
EP-2412712-A1 METHOD FOR PRODUCING EPOXY COMPOUND Showa Denko K.K. (JP) 2012-02-01 EP disclosed
US-20110009652-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND SHOWA DENKO KK (JP) 2011-01-13 US disclosed
EP-2261219-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND Showa Denko K.K. (JP) 2010-12-15 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120029217-A1 PROCESS FOR PRODUCING EPOXY COMPOUND NOX4, NOX5, NOXO1 KMT2A 1235/4885HPGD 263/4885THRB 4769/4885
US-20110009652-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND DUOX2, EPX, DUOX1 KMT2A 1160/4885HPGD 90/4885THRB 4353/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.