SCHEMBL472159

SCHEMBL472159

O=C(CC1=CCCCC1)OCc1ccccc1

nearest known ligand 0.58

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.58
L3MBTL1 Q9Y468 2/20 0.58
MAPK1 P28482 1/20 0.58
HPGD P15428 3/20 0.52
EPHX1 P07099 1/20 0.48
KMT2A Q03164 3/20 0.46
MEN1 O00255 2/20 0.46
THRB P10828 1/20 0.43
MAPT P10636 1/20 0.43
SLC6A2 P23975 1/20 0.42
SLC6A3 Q01959 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
ENPP2 Q13822 1/20 0.41
PAM P19021 1/20 0.41
LMNA P02545 1/20 0.41
LIPE Q05469 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL472137 0.79 HPGD (0.48) ALDH1A1HPGDEPHX1KMT2AMEN1
SCHEMBL6784181 0.77 ALDH1A1 (0.96) ALDH1A1L3MBTL1MAPK1KMT2ASLC6A2
SCHEMBL472103 0.76 ALDH1A1 (0.47) ALDH1A1L3MBTL1HPGDKMT2ATHRB
SCHEMBL8479323 0.76 TDP1 (0.53) ALDH1A1L3MBTL1MAPK1HPGDKMT2A
SCHEMBL8693254 0.75 ALDH1A1 (0.46) ALDH1A1L3MBTL1HPGDKMT2ATHRB
SCHEMBL28820040 0.75 ALDH1A1 (0.46) ALDH1A1L3MBTL1HPGDKMT2ATHRB
SCHEMBL361779 0.75 ALDH1A1 (1.00) ALDH1A1L3MBTL1MAPK1KMT2ASLC6A2
SCHEMBL8735356 0.74 CYP3A4 (0.46) ALDH1A1L3MBTL1MAPK1HPGDEPHX1
SCHEMBL9412365 0.73 HPGD (0.51) ALDH1A1L3MBTL1MAPK1HPGDEPHX1
SCHEMBL21306553 0.73 CES2 (0.53) ALDH1A1MAPK1HPGDEPHX1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8664414-B2 Process for producing epoxy compound SHOWA DENKO K.K. (JP) 2014-03-04 US disclosed
US-8466303-B2 Process for production of epoxy compound SHOWA DENKO K.K. (JP) 2013-06-18 US disclosed
US-20120029217-A1 PROCESS FOR PRODUCING EPOXY COMPOUND SHOWA DENKO K.K. (JP) 2012-02-02 US disclosed
EP-2412712-A1 METHOD FOR PRODUCING EPOXY COMPOUND Showa Denko K.K. (JP) 2012-02-01 EP disclosed
US-20110009652-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND SHOWA DENKO KK (JP) 2011-01-13 US disclosed
EP-2261219-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND Showa Denko K.K. (JP) 2010-12-15 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120029217-A1 PROCESS FOR PRODUCING EPOXY COMPOUND NOX4, NOX5, NOXO1 ALDH1A1 1104/4885L3MBTL1 4587/4885MAPK1 1102/4885
US-20110009652-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND DUOX2, EPX, DUOX1 ALDH1A1 680/4885L3MBTL1 3668/4885MAPK1 1812/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.