SCHEMBL474067

SCHEMBL474067

SC1(c2ccccc2)N=NN=N1

nearest known ligand 0.36

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 2/20 0.31
OPRK1 P41145 1/20 0.31
OPRL1 P41146 1/20 0.31
MAPT P10636 1/20 0.30
MAOB P27338 5/20 0.30
MAOA P21397 4/20 0.30
PNMT P11086 1/20 0.30
TAAR1 Q96RJ0 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9621163 0.75 LMNA (0.38) MAOBMAOA
SCHEMBL5274311 0.72 OPRM1 (0.33) OPRM1OPRK1OPRL1MAPTMAOB
SCHEMBL11852608 0.72 BACE1 (0.32) OPRM1OPRK1OPRL1
Bromide SCHEMBL29801969 0.70 OPRM1 (0.32) OPRM1OPRK1OPRL1MAPTMAOB
SCHEMBL10765712 0.70 CA1 (0.46) OPRM1OPRL1MAPTMAOBMAOA
SCHEMBL5274478 0.68 ALDH1A1 (0.31) OPRM1OPRK1OPRL1MAPTMAOB
SCHEMBL5168618 0.68 OPRM1 (0.31) OPRM1OPRK1OPRL1MAPTMAOB
SCHEMBL7551055 0.68 PNMT (0.39) MAOBMAOAPNMTTAAR1
SCHEMBL434296 0.68 KMT2A (0.33) OPRM1OPRK1OPRL1MAPT
SCHEMBL5276695 0.68 ALDH1A1 (0.38) OPRM1OPRK1OPRL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 214 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023228001-A1 PASSIVATION COATING ON COPPER METAL SURFACE FOR COPPER WIRE BONDING APPLICATION UNIVERSITY OF NORTH TEXAS (US) 2023-11-30 WO claimed
CN-110305178-B Synthetic method of ursodeoxycholic acid 中山百灵生物技术有限公司 2020-07-03 CN claimed
CN-110305178-A A kind of synthetic method of ursodesoxycholic acid 中山百灵生物技术有限公司 2019-10-08 CN claimed
EP-0322553-A1 Silver halide photographic light-sensitive material and a process for forming a high contrastphotographic image DAINIPPON INK AND CHEMICALS, INC. (JP) 1989-07-05 EP claimed
US-4500636-A CONTAINING PHENYL SUBSTITUTED ISOBENZOFURAN BLOCKET PHOTOGRAPHIC AGENT FUJI PHOTO FILM CO., LTD. (JP) 1985-02-19 US claimed
EP-4532796-A1 PASSIVATION COATING ON COPPER METAL SURFACE FOR COPPER WIRE BONDING APPLICATION University of North Texas (US) 2025-04-09 EP disclosed
WO-2023228001-A1 PASSIVATION COATING ON COPPER METAL SURFACE FOR COPPER WIRE BONDING APPLICATION UNIVERSITY OF NORTH TEXAS (US) 2023-11-30 WO disclosed
CN-114891014-A Preparation method and application of benzopyran racemate 中山奕安泰医药科技有限公司 2022-08-12 CN disclosed
WO-2020197963-A1 COATINGS FOR WATERPROOFING ELECTRONIC COMPONENTS HENKEL AG & CO. KGAA (DE) 2020-10-01 WO disclosed
CN-110305178-B Synthetic method of ursodeoxycholic acid 中山百灵生物技术有限公司 2020-07-03 CN disclosed
CN-110305178-A A kind of synthetic method of ursodesoxycholic acid 中山百灵生物技术有限公司 2019-10-08 CN disclosed
EP-3245668-A1 CLEANING COMPOSITION AND METHOD FOR CLEANING SEMICONDUCTOR WAFERS AFTER CMP Cabot Microelectronics Corporation (US) 2017-11-22 EP disclosed
US-4493889-A RED SENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 1985-01-15 US disclosed
EP-0126455-A2 Silver halide photographic emulsion FUJI PHOTO FILM CO., LTD. (JP) 1984-11-28 EP disclosed
EP-0125523-A2 Silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1984-11-21 EP disclosed
EP-0124915-A1 Photographic silver halide material containing a ballasted electron-donor precursor compound AGFA-GEVAERT N.V. (BE) 1984-11-14 EP disclosed
EP-0123983-A2 Silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1984-11-07 EP disclosed
EP-0091788-A2 Silver halide photographic material KONICA CORPORATION (JP) 1983-10-19 EP disclosed
EP-0087880-A2 Silver halide photographic material KONICA CORPORATION (JP) 1983-09-07 EP disclosed
US-4009038-A CYAN COUPLER, A 2-(2'-HYDROXYPHENYL)BENZOTRIAZOLE FUJI PHOTO FILM CO., LTD. (JA) 1977-02-22 US disclosed