SCHEMBL4806088

SCHEMBL4806088

C=CO[Si](=O)[O-].[Na+]

nearest known ligand 0.00

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4812518 0.94
Potassium Ion SCHEMBL4801715 0.94
SCHEMBL4807603 0.94
Lithium Ion SCHEMBL4802627 0.94
Tetramethylammonium Ion SCHEMBL4812006 0.86
Catechol SCHEMBL10818598 0.75
SCHEMBL11227101 0.69
Ethylene SCHEMBL895363 0.67
SCHEMBL3991284 0.65
Ethylene SCHEMBL896158 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119259678-A Preparation method of titanium belt for composite titanium pot 新疆湘润新材料科技有限公司 2025-01-07 CN claimed
CN-114835232-B Defluorinating agent for waste acid and wastewater, application and defluorinating method 中国科学院生态环境研究中心 2023-06-13 CN claimed
CN-115960584-A Temperature control liquid composition for intelligent charging pile and preparation method thereof 合肥华清高科表面技术股份有限公司 2023-04-14 CN claimed
CN-114226636-A Production process method of quick-drying sand core adhesive 马鞍山市三川机械制造有限公司 2022-03-25 CN claimed
CN-114032085-A Efficient gas suspension proppant for fracturing and preparation method thereof 成都理工大学 2022-02-11 CN claimed
CN-109292927-B Waste acid recovery regenerant and preparation and use methods thereof 佛山市海化表面处理科技有限公司 2021-07-02 CN claimed
CN-119259678-A Preparation method of titanium belt for composite titanium pot 新疆湘润新材料科技有限公司 2025-01-07 CN disclosed
CN-114835232-B Defluorinating agent for waste acid and wastewater, application and defluorinating method 中国科学院生态环境研究中心 2023-06-13 CN disclosed
CN-114835232-A Defluorination agent for waste acid wastewater, application and defluorination method 中国科学院生态环境研究中心 2022-08-02 CN disclosed
CN-114032085-B Efficient gas suspension proppant for fracturing and preparation method thereof 成都理工大学 2022-07-15 CN disclosed
CN-114226636-A Production process method of quick-drying sand core adhesive 马鞍山市三川机械制造有限公司 2022-03-25 CN disclosed
CN-114032085-A Efficient gas suspension proppant for fracturing and preparation method thereof 成都理工大学 2022-02-11 CN disclosed
CN-110947519-B Silicate mineral inhibitor and preparation method and application thereof 天津天宝翔科技有限公司 2021-10-26 CN disclosed
CN-110947519-A Silicate mineral inhibitor and preparation method and application thereof 天津天宝翔科技有限公司 2020-04-03 CN disclosed
US-7332446-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-02-19 US disclosed
US-20040188809-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. 2004-09-30 US disclosed
EP-0963344-B1 HYDROPHOBIC ORGANOSILICATE-MODIFIED SILICA GELS DOW CORNING (US) 2004-04-14 EP disclosed
EP-0963344-A1 HYDROPHOBIC ORGANOSILICATE-MODIFIED SILICA GELS DOW CORNING CORPORATION (US) 1999-12-15 EP disclosed
WO-1998037015-A1 HYDROPHOBIC ORGANOSILICATE-MODIFIED SILICA GELS DOW CORNING CORPORATION (US) 1998-08-27 WO disclosed
US-5750610-A Hydrophobic organosilicate-modified silica gels DOW CORNING CORPORATION (US) 1998-05-12 US disclosed