Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS1 | P23219 | 1/20 | 0.58 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.58 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.57 |
| ▸ | USP9X | Q93008 | 1/20 | 0.47 |
| ▸ | CHEK2 | O96017 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.46 |
| ▸ | HTT | P42858 | 3/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.44 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.44 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.44 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.44 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.44 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.44 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.44 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | BLM | P54132 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1599758 | 0.87 | CYP3A4 (0.54) | CHEK2HTTCYP3A4CYP2D6CYP1A2 | |
| SCHEMBL4818537 | 0.85 | KMT2A (0.52) | PTGS1PTGS2AOC3TSHRCYP3A4 | |
| SCHEMBL4818190 | 0.83 | NPC1 (0.50) | PTGS1PTGS2AOC3MAPTLMNA | |
| SCHEMBL4816742 | 0.83 | RAB9A (0.49) | PTGS1PTGS2AOC3CYP3A4CYP2D6 | |
| SCHEMBL17541509 | 0.83 | PTGS1 (0.64) | PTGS1PTGS2AOC3ALOX5HTT | |
| SCHEMBL14376154 | 0.83 | PTGS1 (0.64) | PTGS1PTGS2AOC3ALOX5HTT | |
| SCHEMBL4803759 | 0.83 | PTGS1 (0.54) | PTGS1PTGS2AOC3TSHRALOX5 | |
| SCHEMBL19287601 | 0.83 | PTGS1 (0.64) | PTGS1PTGS2AOC3ALOX5HTT | |
| SCHEMBL4825734 | 0.81 | CTNNB1 (0.52) | PTGS1PTGS2AOC3USP9XMAPT | |
| SCHEMBL22785949 | 0.80 | AOC3 (0.64) | PTGS1PTGS2AOC3TSHRALOX5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12378231-B2 | Small molecules as monoacylglycerol lipase (MAGL) inhibitors, compositions and use thereof | APOGEE PHARMACEUTICALS, INC. (CA) | 2025-08-05 | — | — | US | disclosed |
| US-20240294514-A1 | SMALL MOLECULES AS MONOACYLGLYCEROL LIPASE (MAGL) INHIBITORS, COMPOSITIONS AND USE THEREOF | APOGEE PHARMACEUTICALS, INC. (CA) | 2024-09-05 | — | — | US | disclosed |
| EP-3109703-B1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, AND METHOD FOR FORMING PATTERN USING SAME | TOKYO ELECTRON LTD (JP) | 2020-12-30 | — | — | EP | disclosed |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | TOKYO ELECTRON LIMITED (JP) | 2018-07-17 | — | — | US | disclosed |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | TOKYO ELECTRON LIMITED (JP) | 2018-07-17 | — | — | US | disclosed |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-10 | — | — | US | disclosed |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-10 | — | — | US | disclosed |
| US-9971247-B2 | Pattern-forming method | OSAKA UNIVERSITY (JP) | 2018-05-15 | — | — | US | disclosed |
| US-9971247-B2 | Pattern-forming method | OSAKA UNIVERSITY (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20170131633-A1 | CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-05-11 | — | — | US | disclosed |
| US-7470723-B2 | Diphenylethylene compounds and uses thereof | CELGENE CORPORATION (US) | 2008-12-30 | — | — | US | disclosed |
| US-20080114061-A1 | Diphenylethylene compounds and uses thereof | CELGENE CORPORATION | 2008-05-15 | — | — | US | disclosed |
| US-7312241-B2 | Diphenylethylene compounds and uses thereof | CELGENE CORPORATION (US) | 2007-12-25 | — | — | US | disclosed |
| EP-1799634-A2 | DIPHENYLETHYLENE COMPOUNDS AND USES THEREOF | CELGENE CORPORATION (US) | 2007-06-27 | — | — | EP | disclosed |
| EP-1603864-A4 | DIPHENYLETHYLENE COMPOUNDS AND USES THEREOF | CELGENE CORP (US) | 2007-04-11 | — | — | EP | disclosed |
| WO-2006026747-A2 | DIPHENYLETHYLENE COMPOUNDS AND USES THEREOF | CELGENE CORPORATION (US) | 2006-03-09 | — | — | WO | disclosed |
| EP-1603864-A2 | DIPHENYLETHYLENE COMPOUNDS AND USES THEREOF | CELGENE CORPORATION (US) | 2005-12-14 | — | — | EP | disclosed |
| US-20050107339-A1 | Diphenylethylene compounds and uses thereof | CELGENE CORPORATION | 2005-05-19 | — | — | US | disclosed |
| US-20050014727-A1 | Diphenylethylene compounds and uses thereof | CELGENE CORPORATION | 2005-01-20 | — | — | US | disclosed |
| WO-2004078144-A2 | DIPHENYLETHYLENE COMPOUNDS AND USES THEREOF | CELGENE CORPORATION (US) | 2004-09-16 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050107339-A1 | Diphenylethylene compounds and uses thereof | VHL, TNF, PTGES | PTGS1 22/4885PTGS2 28/4885AOC3 1321/4885 |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | ASIC1, ASIC3, CLTA | PTGS1 3674/4885PTGS2 2928/4885AOC3 4095/4885 |
| US-12378231-B2 | Small molecules as monoacylglycerol lipase (MAGL) inhibitors, compositions and use thereof | MGLL, PNLIP, LPL | PTGS1 1151/4885PTGS2 1462/4885AOC3 1996/4885 |
| US-20240294514-A1 | SMALL MOLECULES AS MONOACYLGLYCEROL LIPASE (MAGL) INHIBITORS, COMPOSITIONS AND USE THEREOF | MGLL, PNLIP, LPL | PTGS1 1151/4885PTGS2 1462/4885AOC3 1996/4885 |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | SLC11A2, XRCC5, RAD54L | PTGS1 3530/4885PTGS2 2694/4885AOC3 3396/4885 |
| US-20080114061-A1 | Diphenylethylene compounds and uses thereof | VHL, TNF, PTGES | PTGS1 22/4885PTGS2 28/4885AOC3 1321/4885 |
| US-20050014727-A1 | Diphenylethylene compounds and uses thereof | VHL, TNF, PTGES | PTGS1 22/4885PTGS2 28/4885AOC3 1321/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.