SCHEMBL4834779

SCHEMBL4834779

CCCCCCCCCCCCc1ccc(S(=O)(=O)OC2C3C(=O)C4C(=O)N(OS(=O)(=O)c5ccc(CCCCCCCCCCCC)cc5)C(=O)C4C3C[N+]2=O)cc1

nearest known ligand 0.34

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 2/20 0.34
▸ MAPT P10636 2/20 0.34
▸ KDM4E B2RXH2 1/20 0.34
▸ F2 P00734 1/20 0.34
▸ VDR P11473 1/20 0.34
▸ CA2 P00918 3/20 0.34
▸ MEN1 O00255 2/20 0.31
▸ KMT2A Q03164 2/20 0.31
▸ ALPL P05186 1/20 0.31
▸ ALPI P09923 1/20 0.31
▸ CA12 O43570 1/20 0.31
▸ CA1 P00915 1/20 0.31
▸ CA9 Q16790 1/20 0.31
▸ FAAH O00519 1/20 0.30
▸ MGLL Q99685 1/20 0.30
▸ SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4831802 0.90 KDM4E (0.43) ALDH1A1MAPTKDM4EF2VDR
SCHEMBL4834039 0.84 VDR (0.40) ALDH1A1MAPTKDM4EF2VDR
SCHEMBL4831861 0.82 ALDH1A1 (0.36) ALDH1A1KDM4E
SCHEMBL4831912 0.82 PARL (0.30) —
SCHEMBL4834979 0.82 PARL (0.42) ALDH1A1MAPTKDM4EF2VDR
SCHEMBL4834868 0.81 PTGS2 (0.36) —
SCHEMBL4835373 0.80 — —
SCHEMBL4832006 0.78 CA2 (0.50) ALDH1A1MAPTKDM4EF2VDR
SCHEMBL4835728 0.78 — —
SCHEMBL4835040 0.76 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 — — US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 — — US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 — — EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition ASIC1, GAR1, RER1 ALDH1A1 633/4885MAPT 868/4885KDM4E 2501/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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