SCHEMBL4834985

SCHEMBL4834985

Cc1ccc(C)c(S(=O)(=O)ON2C(=O)C3C4C=CC(C3C2=O)C2C(=O)N(OS(=O)(=O)c3cc(C)ccc3C)C(=O)C42)c1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.59
KDM4E B2RXH2 3/20 0.59
F2 P00734 3/20 0.59
MAPT P10636 3/20 0.59
KMT2A Q03164 3/20 0.59
HTT P42858 2/20 0.59
XBP1 P17861 1/20 0.59
SMN1; SMN2 Q16637 3/20 0.42
LMNA P02545 2/20 0.42
HPGD P15428 2/20 0.42
MEN1 O00255 1/20 0.42
GAA P10253 3/20 0.36
TDP1 Q9NUW8 1/20 0.36
VDR P11473 1/20 0.35
RAB9A P51151 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
USP2 O75604 1/20 0.35
TSHR P16473 2/20 0.34
UBE2N P61088 1/20 0.34
MAPK1 P28482 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4837145 0.91 ALDH1A1 (0.65) ALDH1A1KDM4EF2MAPTKMT2A
SCHEMBL4827230 0.82 ALDH1A1 (0.60) ALDH1A1KDM4EF2MAPTKMT2A
SCHEMBL4835774 0.80 VDR (0.56) ALDH1A1KDM4EF2MAPTKMT2A
SCHEMBL4834877 0.78 MAPT (0.38) ALDH1A1KDM4EF2MAPTKMT2A
SCHEMBL2958322 0.77 ALDH1A1 (0.65) ALDH1A1KDM4EF2MAPTKMT2A
SCHEMBL4834939 0.72 ALDH1A1 (0.43) ALDH1A1KDM4EF2MAPTKMT2A
SCHEMBL4829809 0.71 ALDH1A1 (0.57) ALDH1A1KDM4EF2MAPTKMT2A
SCHEMBL4827225 0.70 PARL (0.57) ALDH1A1KDM4EF2MAPTKMT2A
SCHEMBL2323791 0.69 ALDH1A1 (0.54) ALDH1A1KDM4EF2MAPTKMT2A
SCHEMBL3830348 0.69 ALDH1A1 (0.74) ALDH1A1KDM4EF2MAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition ASIC1, GAR1, RER1 ALDH1A1 633/4885KDM4E 2501/4885F2 2866/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.