Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.52 |
| ▸ | RAB9A | P51151 | 5/20 | 0.51 |
| ▸ | MEN1 | O00255 | 2/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.51 |
| ▸ | NPC1 | O15118 | 4/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.50 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.50 |
| ▸ | CA12 | O43570 | 1/20 | 0.50 |
| ▸ | CA1 | P00915 | 1/20 | 0.50 |
| ▸ | IDO1 | P14902 | 1/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.50 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.50 |
| ▸ | CA9 | Q16790 | 1/20 | 0.50 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.50 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.50 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.50 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.50 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.50 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25142228 | 0.82 | CES2 (0.57) | CES1RAB9ANPC1CRHBPCRHR2 | |
| SCHEMBL25142224 | 0.82 | PLOD2 (0.52) | CES1ALDH1A1RAB9AMEN1KMT2A | |
| SCHEMBL4924649 | 0.82 | RAB9A (0.57) | CES1ALDH1A1RAB9AMEN1KMT2A | |
| SCHEMBL76489 | 0.79 | ALDH1A1 (0.67) | CES1ALDH1A1RAB9AMEN1KMT2A | |
| SCHEMBL22472043 | 0.79 | ALDH1A1 (0.52) | ALDH1A1RAB9AMEN1KMT2ANPC1 | |
| SCHEMBL10265496 | 0.79 | LMNA (0.59) | ALDH1A1RAB9AMEN1KMT2ANPC1 | |
| Trifluoroacetic Acid SCHEMBL1786802 | 0.78 | CES1 (0.52) | CES1ALDH1A1RAB9ANPC1HSD17B10 | |
| Hydrochloric Acid SCHEMBL27693713 | 0.77 | ALDH1A1 (0.64) | CES1ALDH1A1RAB9AMEN1KMT2A | |
| SCHEMBL2746306 | 0.76 | EPHX1 (0.54) | ALDH1A1RAB9AMEN1KMT2ANPC1 | |
| SCHEMBL9775662 | 0.76 | CES1 (0.46) | CES1ALDH1A1RAB9AMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0888319-A1 | SUBSTITUTED 1,2,3,4-TETRAHYDRONAPHTHALENE DERIVATIVES | Astra Aktiebolag (SE) | 1999-01-07 | — | — | EP | claimed |
| WO-1997034883-A1 | SUBSTITUTED 1,2,3,4-TETRAHYDRONAPHTHALENE DERIVATIVES | ASTRA AKTIEBOLAG (SE) | 1997-09-25 | — | — | WO | claimed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11711934-B2 | Metal amides for use as HIL for an organic light-emitting diode (OLED) | NOVALED GMBH (DE) | 2023-07-25 | — | — | US | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230152692-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230120132-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-20 | — | — | US | disclosed |
| EP-4084108-A1 | METAL AMIDES FOR USE AS HIL FOR AN ORGANIC LIGHT-EMITTING DIODE (OLED) | Novaled GmbH (DE) | 2022-11-02 | — | — | EP | disclosed |
| EP-3338313-B1 | METAL AMIDES FOR USE AS HOLE INJECTION LAYER FOR AN ORGANIC LIGHT-EMITTING DIODE (OLED) | NOVALED GMBH (DE) | 2022-01-05 | — | — | EP | disclosed |
| EP-3338314-B1 | TRIARYL AMINE THICK LAYER DOPED WITH METAL AMIDES FOR USE AS HOLE INJECTION LAYER FOR AN ORGANIC LIGHT-EMITTING DIODE (OLED) | NOVALED GMBH (DE) | 2020-02-12 | — | — | EP | disclosed |
| EP-3133663-A1 | METAL AMIDES FOR USE AS HOLE INJECTION LAYER FOR AN ORGANIC LIGHT-EMITTING DIODE (OLED) | Novaled GmbH (DE) | 2017-02-22 | — | — | EP | disclosed |
| EP-3133664-A1 | TRIARYL AMINE THICK LAYER DOPED WITH METAL AMIDES FOR USE AS HOLE INJECTION LAYER FOR AN ORGANIC LIGHT-EMITTING DIODE (OLED) | Novaled GmbH (DE) | 2017-02-22 | — | — | EP | disclosed |
| US-7319101-B2 | COMT inhibitors for the treatment of depression and impaired cognition | HOFFMANN-LA ROCHE INC. (US) | 2008-01-15 | — | — | US | disclosed |
| US-20050137162-A1 | New COMT inhibitors for the treatment of depression and impaired cognition | F. HOFFMANN-LA ROCHE AG (CH) | 2005-06-23 | — | — | US | disclosed |
| EP-0888319-A1 | SUBSTITUTED 1,2,3,4-TETRAHYDRONAPHTHALENE DERIVATIVES | Astra Aktiebolag (SE) | 1999-01-07 | — | — | EP | disclosed |
| WO-1997034883-A1 | SUBSTITUTED 1,2,3,4-TETRAHYDRONAPHTHALENE DERIVATIVES | ASTRA AKTIEBOLAG (SE) | 1997-09-25 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050137162-A1 | New COMT inhibitors for the treatment of depression and impaired cognition | COMT, MAOB, TPH1 | CES1 18/4885ALDH1A1 46/4885RAB9A 487/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.