SCHEMBL486931

SCHEMBL486931

CCc1cc[c]c(C)c1C

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 2/20 0.31
GABRB2 P47870 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL454953 0.79 GABRA1 (0.30) GABRA1GABRB2
SCHEMBL28102825 0.79 AOC1 (0.30)
SCHEMBL458201 0.79 NOS3 (0.32) GABRA1GABRB2
SCHEMBL2968255 0.79 TYR (0.37)
SCHEMBL9359711 0.77 GABRA1 (0.38) GABRA1GABRB2
SCHEMBL10566581 0.77 CTRC (0.32)
SCHEMBL11341137 0.77 TYR (0.43)
SCHEMBL10497011 0.76
SCHEMBL11873300 0.76 TYR (0.46)
SCHEMBL2965993 0.76 TYR (0.46)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 133 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114303096-A Film-forming composition for lithography, resist pattern formation method, circuit pattern formation method, and purification method 三菱瓦斯化学株式会社 2022-04-08 CN disclosed
CN-113242750-A Microcapsules 西姆莱斯股份公司 2021-08-10 CN disclosed
US-20210003921-A1 COMPOUND, RESIN, COMPOSITION, AND FILM FORMING MATERIAL FOR LITHOGRAPHY USING THE SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-01-07 US disclosed
EP-3760611-A1 COMPOUND, RESIN, COMPOSITION AND FILM-FORMING MATERIAL FOR LITHOGRAPHY USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-01-06 EP disclosed
CN-111788176-A Compound, resin, composition, and film-forming material for lithography using same 三菱瓦斯化学株式会社 2020-10-16 CN disclosed
US-20200172470-A1 NOVEL (POLY)AMINE COMPOUND, RESIN AND CURED PRODUCT MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-06-04 US disclosed
EP-3659996-A1 NOVEL (POLY)AMINE COMPOUND, RESIN, AND CURED PRODUCT Mitsubishi Gas Chemical Company, Inc. (JP) 2020-06-03 EP disclosed
CN-110944975-A Novel (poly) amine compound, resin, and cured product 三菱瓦斯化学株式会社 2020-03-31 CN disclosed
US-10451184-B2 Sliding member and method for producing same NISSAN MOTOR CO., LTD. (JP) 2019-10-22 US disclosed
EP-2949783-B1 SLIDING MEMBER AND METHOD FOR PRODUCING SAME NISSAN MOTOR (JP) 2019-10-09 EP disclosed
EP-1122295-A1 GASOLINE ADDITIVE FOR DIRECT-INJECTION GASOLINE ENGINE Nippon Mitsubishi Oil Corporation (JP) 2001-08-08 EP disclosed
US-20010005957-A1 Fuel additive and fuel composition NIPPON MITSUBISHI OIL CORPORATION 2001-07-05 US disclosed
EP-1018538-A1 REFRIGERATOR OIL COMPOSITION AND REFRIGERATOR FLUID COMPOSITION Nippon Mitsubishi Oil Corporation (JP) 2000-07-12 EP disclosed
US-5928393-A ESTERIFIED, ALKOXYLATED TERTIARY AMINE COMPOUND; DETERGENT ANTISLUDGE/ANTIDEPOSIT AGENT FOR INTERNAL COMBUSTION ENGINES NIPPON OIL CO., LTD. (JP) 1999-07-27 US disclosed
EP-0905217-A1 Unleaded gasoline for direct injection gasoline engine NIPPON OIL CO. LTD. (JP) 1999-03-31 EP disclosed
US-5837016-A ETHERIFIED (POLY)OXYALKYLENE GLYCOL CONTAINING AN AMIDE GROUP; INTERNAL COMBUSTION ENGINE ANTIDEPOSIT AGENTS NIPPON OIL CO., LTD. (JP) 1998-11-17 US disclosed
US-5755833-A URETHANE COMPOUND; ANTIDEPOSIT, ANTISLUDGING AGENT; GASOLINE NIPPON OIL CO., LTD. (JP) 1998-05-26 US disclosed
EP-0819753-A1 Fuel additive NIPPON OIL CO. LTD. (JP) 1998-01-21 EP disclosed
EP-0801128-A1 Fuel additive NIPPON OIL CO. LTD. (JP) 1997-10-15 EP disclosed
EP-0723985-A1 Fuel additive NIPPON OIL CO. LTD. (JP) 1996-07-31 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210003921-A1 COMPOUND, RESIN, COMPOSITION, AND FILM FORMING MATERIAL FOR LITHOGRAPHY USING THE SAME COL1A1, MLLT3, F12 GABRA1 1717/4885GABRB2 3114/4885
US-20200172470-A1 NOVEL (POLY)AMINE COMPOUND, RESIN AND CURED PRODUCT PAM, CBR1, KDM1A GABRA1 1093/4885GABRB2 1916/4885
US-20010005957-A1 Fuel additive and fuel composition NOTUM, DEGS1, NDUFC1 GABRA1 4219/4885GABRB2 4315/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.