Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.53 |
| ▸ | LMNA | P02545 | 1/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.53 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.53 |
| ▸ | SLC5A7 | Q9GZV3 | 1/20 | 0.53 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.38 |
| ▸ | PSMD14 | O00487 | 1/20 | 0.37 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.37 |
| ▸ | MMP2 | P08253 | 1/20 | 0.37 |
| ▸ | RAD52 | P43351 | 1/20 | 0.37 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL11035191 | 0.96 | MEN1 (0.50) | MEN1LMNAKMT2ACYP3A4SLC5A7 | |
| SCHEMBL159367 | 0.96 | MEN1 (0.56) | MEN1LMNAKMT2ACYP3A4SLC5A7 | |
| SCHEMBL8995906 | 0.92 | MEN1 (0.53) | MEN1LMNAKMT2ACYP3A4SLC5A7 | |
| Bromide SCHEMBL15820401 | 0.92 | MEN1 (0.62) | MEN1LMNAKMT2ACYP3A4SLC5A7 | |
| SCHEMBL10416317 | 0.92 | MEN1 (0.53) | MEN1LMNAKMT2ACYP3A4SLC5A7 | |
| SCHEMBL10416316 | 0.92 | MEN1 (0.53) | MEN1LMNAKMT2ACYP3A4SLC5A7 | |
| SCHEMBL15761660 | 0.92 | MEN1 (0.53) | MEN1LMNAKMT2ACYP3A4SLC5A7 | |
| Hydrochloric Acid SCHEMBL2444152 | 0.92 | CYP3A4 (0.62) | MEN1LMNAKMT2ACYP3A4SLC5A7 | |
| Fluoride Ion SCHEMBL190626 | 0.92 | MEN1 (0.53) | MEN1LMNAKMT2ACYP3A4SLC5A7 | |
| Iodide SCHEMBL17865374 | 0.92 | MEN1 (0.53) | MEN1LMNAKMT2ACYP3A4SLC5A7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1542 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4743526-A2 | POLISHING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2026-05-20 | — | — | EP | claimed |
| US-12599937-B2 | Water-based, high-efficiency chemical reagent for substrate surface particle removal | APPLIED MATERIALS, INC. (US) | 2026-04-14 | — | — | US | claimed |
| US-20260042976-A1 | COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM ELECTRONIC MAT USA INC (US) | 2026-02-12 | — | — | US | claimed |
| US-20260015560-A1 | COMPOSITIONS FOR POST-CMP CLEANING OF MICROELECTRONIC DEVICES | ENTEGRIS INC (US) | 2026-01-15 | — | — | US | claimed |
| EP-3894512-B1 | COMPOSITION AND METHOD FOR SELECTIVELY ETCHING RUTHENIUM AND/OR COPPER | ENTEGRIS INC (US) | 2025-12-24 | — | — | EP | claimed |
| US-20250333849-A1 | SOLVENT-BASED COMPOSITIONS AND RELATED METHODS FOR MOLYBDENUM ETCHING | ENTEGRIS INC (US) | 2025-10-30 | — | — | US | claimed |
| US-20250333622-A1 | POLISHING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-10-30 | — | — | US | claimed |
| EP-3737753-B1 | USE OF TRI- AND TETRA-HYDROXYL QUATERNARY AMMONIUM COMPOUNDS AS RESOLVING AGENTS FOR ELECTROPHORESITIC SEPARATIONS | AGILENT TECHNOLOGIES INC (US) | 2025-10-22 | — | — | EP | claimed |
| US-20250290013-A1 | CLEANING SOLUTION COMPOSITION USED AFTER METAL FILM POLISHING | KCTECH CO., LTD. (KR) | 2025-09-18 | — | — | US | claimed |
| US-20250277171-A1 | COMPOSITION FOR POST-CMP CLEANING | ENTEGRIS, INC. | 2025-09-04 | — | — | US | claimed |
| EP-0134708-A2 | Process for preparing colloidal solution of antimony pentoxide | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1985-03-20 | — | — | EP | claimed |
| US-4464461-A | QUATERNARY ALKANOL AMMONIUM HYDROXIDE DEVELOPER AND A SEMICARBIZIDE STABILIZER | EASTMAN KODAK COMPANY (US) | 1984-08-07 | — | — | US | claimed |
| EP-0107284-A2 | Process for the preparation of dispersions and gels | UNITED KINGDOM ATOMIC ENERGY AUTHORITY (GB) | 1984-05-02 | — | — | EP | claimed |
| EP-0023758-B1 | STABILISED DEVELOPER CONCENTRATES AND DEVELOPERS CONTAINING A QUATERNARY ALKANOL AMMONIUM HYDROXIDE | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1982-12-08 | — | — | EP | claimed |
| US-4355118-A | POLYISOCYANATE, ALKALIMETAL SILICATE, ONIUM COMPOUND | MOBAY CHEMICAL CORPORATION (US) | 1982-10-19 | — | — | US | claimed |
| EP-0056145-A1 | Process for the production of inorganic-organic foams | Mobay Chemical Corporation (US) | 1982-07-21 | — | — | EP | claimed |
| US-4294911-A | AND A QUATERNARY ALKANOL AMMONIUM HYDROXIDE DEVELOPING AGENT | EASTMAN KODAK COMPANY (US) | 1981-10-13 | — | — | US | claimed |
| EP-0023758-A1 | Stabilised developer concentrates and developers containing a quaternary alkanol ammonium hydroxide | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1981-02-11 | — | — | EP | claimed |
| US-4141733-A | Development of light-sensitive quinone diazide compositions | EASTMAN KODAK COMPANY (US) | 1979-02-27 | — | — | US | claimed |
| US-4078029-A | COATING, SANDING, DRYING, CALCINING, TRI- OR TETRA- ETHANOL AMMONIUM SILICATE, SILICA SOL | NISSAN CHEMICAL INDUSTRIES, LTD. (JA) | 1978-03-07 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260015560-A1 | COMPOSITIONS FOR POST-CMP CLEANING OF MICROELECTRONIC DEVICES | TET2, ASIC1, PIEZO1 | MEN1 2976/4885LMNA 2078/4885KMT2A 778/4885 |
| US-12599937-B2 | Water-based, high-efficiency chemical reagent for substrate surface particle removal | STUB1, CD2, EPCAM | MEN1 2673/4885LMNA 378/4885KMT2A 244/4885 |
| US-20260042976-A1 | COMPOSITIONS AND METHODS OF USE THEREOF | ACP1, PLOD1, CA1 | MEN1 2500/4885LMNA 3360/4885KMT2A 434/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.