Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOA | P21397 | 3/20 | 0.45 |
| ▸ | MAOB | P27338 | 3/20 | 0.45 |
| ▸ | HAO1 | Q9UJM8 | 1/20 | 0.43 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.42 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.40 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | PPARG | P37231 | 1/20 | 0.37 |
| ▸ | PPARA | Q07869 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | SCN9A | Q15858 | 1/20 | 0.36 |
| ▸ | LTA4H | P09960 | 1/20 | 0.36 |
| ▸ | PRMT5 | O14744 | 1/20 | 0.36 |
| ▸ | EGFR | P00533 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2519476 | 0.78 | MAOA (0.37) | MAOAMAOBSLC6A4ALOX5HSD17B10 | |
| SCHEMBL6076179 | 0.75 | MAOA (0.60) | MAOAMAOBHAO1SLC6A4HSD17B10 | |
| SCHEMBL8666419 | 0.73 | PTGS2 (0.45) | PTGS1CYP3A4NPC1RAB9A | |
| SCHEMBL490735 | 0.72 | ALDH1A1 (0.41) | HSD17B10CYP3A4NPC1RAB9A | |
| SCHEMBL491053 | 0.71 | ALDH1A1 (0.39) | NPC1RAB9A | |
| SCHEMBL332623 | 0.71 | MAOA (0.63) | MAOAMAOBHAO1SLC6A4HSD17B10 | |
| SCHEMBL5317061 | 0.69 | HAO1 (0.56) | MAOAMAOBHAO1SLC6A4ALOX5 | |
| SCHEMBL28084553 | 0.69 | MAOA (0.61) | MAOAMAOBHAO1SLC6A4HSD17B10 | |
| SCHEMBL14685048 | 0.68 | NPC1 (0.55) | MAOAMAOBHAO1SLC6A4HSD17B10 | |
| SCHEMBL14973574 | 0.67 | NPC1 (0.41) | NPC1RAB9APOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8652759-B2 | Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer | EASTMAN KODAK COMPANY (US) | 2014-02-18 | — | — | US | disclosed |
| EP-1849600-B1 | Bakeable radiation-sensitive elements with a high resistance to chemicals | EASTMAN KODAK CO (US) | 2013-12-11 | — | — | EP | disclosed |
| US-8507181-B2 | Method for developing and sealing of lithographic printing plates | KODAK (NEAR EAST) INC. | 2013-08-13 | — | — | US | disclosed |
| US-8137891-B2 | Bakeable lithographic printing plates with a high resistance to chemicals | EASTMAN KODAK COMPANY (US) | 2012-03-20 | — | — | US | disclosed |
| US-8119331-B2 | Photopolymer composition usable for lithographic plates | KODAK GRAPHIC COMMUNICATIONS GMBH (DE) | 2012-02-21 | — | — | US | disclosed |
| US-8105755-B2 | Method for processing of photopolymer printing plates with overcoat | EASTMAN KODAK COMPANY (US) | 2012-01-31 | — | — | US | disclosed |
| US-20110223540-A1 | GUMMING COMPOSITIONS WITH NANO-PARTICLES FOR IMPROVING SCRATCH SENSITIVITY IN IMAGE AND NON-IMAGE AREAS OF LITHOGRAPHIC PRINTING PLATES | EASTMAN KODAK COMPANY | 2011-09-15 | — | — | US | disclosed |
| EP-2217450-B1 | PROCESSING OF LITHOGRAPHIC PRINTING PLATES WITH HYDROPHILIC POLYMER IN FINISHER SOLUTION | EASTMAN KODAK CO (US) | 2011-06-15 | — | — | EP | disclosed |
| US-7955776-B2 | Light sensitive elements comprising substrates having coatings comprising photoinitiators or sensitizers, biuret structural and phosphazene oligomers, having improved photosensitivity, storage stability and wear resistance; photolithography | EASTMAN KODAK COMPANY (US) | 2011-06-07 | — | — | US | disclosed |
| EP-1868036-B1 | Method for processing of photopolymer printing plates with overcoat | EASTMAN KODAK CO (US) | 2010-09-22 | — | — | EP | disclosed |
| US-20070142490-A1 | Radiation-sensitive compositions and imageable elements based thereon | BAUMANN HARALD | 2007-06-21 | — | — | US | disclosed |
| WO-2007009580-A2 | PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES | EASTMAN KODAK COMPANY (US) | 2007-01-25 | — | — | WO | disclosed |
| US-20060154169-A1 | Radiation-sensitive compositions comprising a 1,4-dihydropyridine sensitizer and imageable elements based thereon | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2006-07-13 | — | — | US | disclosed |
| WO-2006044243-A2 | HOLOGRAPHIC STORAGE MEDIUM | GENERAL ELECTRIC COMPANY A CORPORATION OF THE STATE OF NEW YORK (US) | 2006-04-27 | — | — | WO | disclosed |
| US-20060078802-A1 | Holographic storage medium | SABIC INNOVATIVE PLASTICS IP B.V. | 2006-04-13 | — | — | US | disclosed |
| US-20060063101-A1 | Radiation-sensitive elements | KODAK POLYCHROME GRAPHICS LLC (US) | 2006-03-23 | — | — | US | disclosed |
| EP-1586006-A1 | RADIATION-SENSITIVE ELEMENTS | Kodak Polychrome Graphics GmbH (DE) | 2005-10-19 | — | — | EP | disclosed |
| WO-2004111731-A1 | RADIATION-SENSITIVE COMPOSITIONS COMPRISING A 1,4-DIHYDROPYRIDINE SENSITIZER AND IMAGEABLE ELEMENTS BASED THEREON | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2004-12-23 | — | — | WO | disclosed |
| WO-2004049068-A1 | RADIATION-SENSITIVE ELEMENTS | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2004-06-10 | — | — | WO | disclosed |
| US-4017313-A | Photosensitive composition containing a leuco dye, a photosensitizer, an aromatic aldehyde and a secondary or tertiary amine and the use thereof in a direct-print process | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-04-12 | — | — | US | disclosed |