Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RAPGEF4 | Q8WZA2 | 1/20 | 0.40 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.34 |
| ▸ | GAA | P10253 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | ESR1 | P03372 | 2/20 | 0.34 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.34 |
| ▸ | HTR2A | P28223 | 1/20 | 0.34 |
| ▸ | HTR2C | P28335 | 1/20 | 0.34 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.34 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.34 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
| ▸ | KAT6A | Q92794 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4541609 | 0.91 | RAPGEF4 (0.42) | RAPGEF4HSD11B1KMT2AGAAMEN1 | |
| SCHEMBL27503502 | 0.84 | EPHX2 (0.39) | RAPGEF4HTR2AHTR2CPOLBLMNA | |
| SCHEMBL15101771 | 0.81 | RAPGEF4 (0.43) | RAPGEF4HSD11B1KMT2AGAAMEN1 | |
| SCHEMBL25431421 | 0.79 | RAPGEF4 (0.38) | RAPGEF4HSD11B1KMT2AGAAMEN1 | |
| SCHEMBL64020 | 0.77 | KMT2A (0.39) | RAPGEF4HSD11B1KMT2AGAAMEN1 | |
| SCHEMBL3193127 | 0.77 | SMN1; SMN2 (0.40) | HSD11B1KMT2AKDM4ETDP1LMNA | |
| SCHEMBL29130823 | 0.77 | BCAT2 (0.38) | HSD11B1LMNA | |
| SCHEMBL7962765 | 0.72 | ALDH1A1 (0.37) | RAPGEF4HSD11B1KMT2AGAAMEN1 | |
| SCHEMBL60930 | 0.71 | GAA (0.43) | RAPGEF4KMT2AGAAMEN1POLB | |
| SCHEMBL15437896 | 0.71 | SLC1A3 (0.44) | RAPGEF4HSD11B1KMT2AGAAMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103930448-B | Photocurable composition and the patterning method using the Photocurable composition | 佳能株式会社 | 2017-11-17 | — | — | CN | disclosed |
| CN-106795287-A | Silicone polymers combination | 科恩托罗尼丝株式会社 | 2017-05-31 | — | — | CN | disclosed |
| CN-103907174-B | The forming method of film | 佳能株式会社 | 2016-09-07 | — | — | CN | disclosed |
| CN-104350084-A | Polymer having terminal structure including plurality of reactive silicon groups, method for manufacturing same, and use for same | KANEKA CORP | 2015-02-11 | — | — | CN | disclosed |
| CN-103930448-A | Photo-curable composition and patterning method using the same | CANON KK | 2014-07-16 | — | — | CN | disclosed |
| CN-103907174-A | Method of forming film | CANON KK | 2014-07-02 | — | — | CN | disclosed |
| CN-102597048-B | Bilayer system comprising a polydimethylglutarimide-based underlayer and composition thereof | IBM | 2014-03-26 | — | — | CN | disclosed |
| CN-101946209-B | Silicon-containing resist underlayer film-forming composition containing cyclic amino group | NISSAN CHEMICAL IND LTD | 2014-01-22 | — | — | CN | disclosed |
| CN-101910949-B | Composition for forming resist underlayer film containing silicon and having urea group | NISSAN CHEMICAL IND LTD | 2013-07-24 | — | — | CN | disclosed |
| CN-101910318-B | Siloxane resin compositions | TORAY INDUSTRIES | 2012-10-24 | — | — | CN | disclosed |
| CN-101946209-A | Silicon-containing resist underlayer film-forming composition containing cyclic amino group | NISSAN CHEMICAL IND LTD | 2011-01-12 | — | — | CN | disclosed |
| CN-101910318-A | Siloxane resin compositions | TORAY INDUSTRIES | 2010-12-08 | — | — | CN | disclosed |
| CN-101910949-A | Composition for forming resist underlayer film containing silicon and having urea group | NISSAN CHEMICAL IND LTD | 2010-12-08 | — | — | CN | disclosed |
| CN-100390232-C | Composition for forming organic insulating film and organic insulating film formed from the same | SAMSUNG ELECTRONICS CO LTD (KR) | 2008-05-28 | — | — | CN | disclosed |
| US-20080118870-A1 | Sulfur Atom-Containing Anti-Reflective Coating Forming Composition For Lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-05-22 | — | — | US | disclosed |
| CN-101154041-A | Radiation sensitive resin composition, and formation of interlayer insulating film and microlens | JSR CORP (JP) | 2008-04-02 | — | — | CN | disclosed |
| CN-1908816-A | Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material | JSR CORP (JP) | 2007-02-07 | — | — | CN | disclosed |
| CN-1242303-C | Agent for lowering dependence of substrate | WAKO PURE CHEM IND LTD (JP) | 2006-02-15 | — | — | CN | disclosed |
| CN-1637066-A | Composition for forming organic insulating film and organic insulating film formed from the same | SAMSUNG ELECTRONICS CO LTD (KR) | 2005-07-13 | — | — | CN | disclosed |
| CN-1278076-A | Agent for lowering dependence of substrate | WAKO PURE CHEM IND LTD (JP) | 2000-12-27 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080118870-A1 | Sulfur Atom-Containing Anti-Reflective Coating Forming Composition For Lithography | TPMT, TST, TMT1A | RAPGEF4 3331/4885HSD11B1 2902/4885KMT2A 494/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.