SCHEMBL4958265

SCHEMBL4958265

CC(Cc1ccccc1)c1ccc2c(c1)C(=O)OC2=O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.41
ALOX15 P16050 1/20 0.39
ESR1 P03372 1/20 0.39
ESR2 Q92731 1/20 0.39
TAAR1 Q96RJ0 5/20 0.38
SIGMAR1 Q99720 3/20 0.38
SLC6A2 P23975 2/20 0.38
MAOA P21397 1/20 0.38
SLC6A4 P31645 1/20 0.38
SLC6A3 Q01959 1/20 0.38
CYP2A6 P11509 1/20 0.38
ADORA2A P29274 1/20 0.38
ADORA1 P30542 1/20 0.38
ALDH1A1 P00352 3/20 0.37
NPC1 O15118 2/20 0.37
RAB9A P51151 2/20 0.37
LMNA P02545 1/20 0.37
MAPT P10636 1/20 0.37
MAPK1 P28482 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9516526 0.84 FOLH1 (0.46) KMT2A
SCHEMBL13397789 0.80 HDAC4 (0.47) TDP1ALOX15ALDH1A1NPC1RAB9A
SCHEMBL2820073 0.78 FFAR1 (0.49) ALDH1A1KMT2A
Benzene SCHEMBL4958274 0.78 LMNA (0.50) TDP1ALOX15ALDH1A1LMNAMAPT
SCHEMBL15511869 0.77 TDP1 (0.45) TDP1ALOX15ESR1ESR2ALDH1A1
SCHEMBL433935 0.76 ALDH1A1 (0.48) TDP1ALOX15ESR1ESR2ALDH1A1
SCHEMBL11436231 0.76 LMNA (0.52) TDP1ALOX15ALDH1A1LMNAMAPT
SCHEMBL4570306 0.75 TRPA1 (0.42) TDP1ALOX15TAAR1ALDH1A1MAPK1
SCHEMBL9718941 0.73 ALOX15 (0.43) TDP1ALOX15ALDH1A1LMNA
SCHEMBL10328403 0.73 UGT2B7 (0.46) TDP1ALOX15ALDH1A1LMNAMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1321487-B1 POLYAMIC ACID, POLYIMIDE, PROCESS FOR PRODUCING THESE, AND FILM OF THE POLYIMIDE MITSUI CHEMICALS INC (JP) 2008-02-27 EP disclosed
EP-1148078-B1 POLYIMIDE CONTAINING CROSSLINKABLE GROUP AND PROCESS FOR PRODUCING THE SAME MITSUI CHEMICALS INC (JP) 2006-11-29 EP disclosed
US-6734276-B2 RANDOM COPOLYMER WITH UNITS DERIVED FROM PYROMELLITIC ACID, P-PHENYLENEDIAMINE, AND AT LEAST ONE OF M-PHENYLENEDIAMINE, BIS(P-AMINOPHENYL) ETHER, AND DIAMINOMETHYLNORBORNANE; LINEAR EXPANSION COEFFICIENT; SHRINKAGE INHIBITION MITSUI CHEMICALS, INC. (JP) 2004-05-11 US disclosed
US-6710160-B2 VARNISH HAVING IMPROVED SMOOTHNESS, THERMAL RESISTANCE, MELT FLOWABILITY, OPTICAL PROPERTIES AND CHEMICAL RESISTANCE; DIELECTRICS MITSUI CHEMICALS, INC. (JP) 2004-03-23 US disclosed
EP-1321487-A1 POLYAMIC ACID, POLYIMIDE, PROCESS FOR PRODUCING THESE, AND FILM OF THE POLYIMIDE Mitsui Chemicals, Inc. (JP) 2003-06-25 EP disclosed
US-20030064235-A1 Optical members made of polymide resins MITSUI CHEMICALS, INC. (JP) 2003-04-03 US disclosed
US-6531568-B1 Melt processable thermoplastic resins formed from chemical intermediates such as polyamic acids having chemical, heat, oxidation and radiation resistance MITSUI CHEMICALS, INC. (JP) 2003-03-11 US disclosed
US-20030013838-A1 Novel polyimide and circuit substrate comprising the same MITSUI CHEMICALS, INC. (JP) 2003-01-16 US disclosed
US-20020188090-A1 Polyamic acid, polyimide, process for producing these, and film of the polyimide MITSUI CHEMICALS, INC. (JP) 2002-12-12 US disclosed
EP-1236756-A1 NOVEL POLYIMIDE AND CIRCUIT SUBSTRATE COMPRISING THE SAME Mitsui Chemicals, Inc. (JP) 2002-09-04 EP disclosed
EP-1237015-A1 OPTICAL MEMBERS MADE OF POLYIMIDE RESINS Mitsui Chemicals, Inc. (JP) 2002-09-04 EP disclosed
EP-1148078-A1 POLYIMIDE CONTAINING CROSSLINKABLE GROUP AND PROCESS FOR PRODUCING THE SAME Mitsui Chemicals, Inc. (JP) 2001-10-24 EP disclosed