Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | CACNA2D1 | P54289 | 2/20 | 0.35 |
| ▸ | CACNB3 | P54284 | 1/20 | 0.35 |
| ▸ | CACNA1C | Q13936 | 1/20 | 0.35 |
| ▸ | PGR | P06401 | 1/20 | 0.35 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.35 |
| ▸ | HTR2B | P41595 | 1/20 | 0.35 |
| ▸ | CACNA2D2 | Q9NY47 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.35 |
| ▸ | MMP1 | P03956 | 1/20 | 0.34 |
| ▸ | MMP2 | P08253 | 1/20 | 0.34 |
| ▸ | MMP3 | P08254 | 1/20 | 0.34 |
| ▸ | MMP9 | P14780 | 1/20 | 0.34 |
| ▸ | MMP13 | P45452 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | MMP12 | P39900 | 1/20 | 0.33 |
| ▸ | GABRR1 | P24046 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15987193 | 0.83 | SLC22A6 (0.42) | SLC22A6TDP1CACNA2D1CACNB3CACNA1C | |
| SCHEMBL886928 | 0.83 | SLC22A6 (0.42) | SLC22A6TDP1CACNA2D1CACNB3CACNA1C | |
| SCHEMBL28772970 | 0.81 | GABRP (0.38) | SLC22A6TDP1CACNA2D1CACNB3CACNA1C | |
| SCHEMBL12729926 | 0.80 | ALDH1A1 (0.48) | TDP1SMN1; SMN2MMP1MMP2MMP3 | |
| SCHEMBL13424255 | 0.78 | SLC22A6 (0.42) | SLC22A6TDP1SMN1; SMN2ALOX15MAPT | |
| SCHEMBL25946703 | 0.75 | MMP1 (0.39) | SLC22A6TDP1CACNA2D1CACNB3CACNA1C | |
| SCHEMBL18327240 | 0.75 | PGD (0.35) | SLC22A6TDP1CACNA2D1CACNB3CACNA1C | |
| SCHEMBL20543906 | 0.75 | SLC22A6 (0.39) | SLC22A6TDP1SMN1; SMN2MAPTGABRR1 | |
| SCHEMBL10827451 | 0.74 | CACNA2D1 (0.46) | CACNA2D1CACNB3CACNA1CPGRADRA1A | |
| SCHEMBL8752294 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115707794-A | Surface-binding agent and method for treating substrate surface | 柏群科技有限公司 | 2023-02-21 | — | — | CN | disclosed |
| US-20230011185-A1 | LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-12 | — | — | US | disclosed |
| CN-115315783-A | Laminate, method for producing laminate, and method for producing semiconductor substrate | 东京应化工业株式会社 | 2022-11-08 | — | — | CN | disclosed |
| US-11120993-B2 | Diffusing agent composition and method of manufacturing semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-09-14 | — | — | US | disclosed |
| US-10961422-B2 | Surface treatment liquid, surface treatment method, and method for suppressing pattern collapse | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-03-30 | — | — | US | disclosed |
| US-20200373162-A1 | DIFFUSING AGENT COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-11-26 | — | — | US | disclosed |
| US-10720321-B2 | Substrate treating method and semiconductor device manufacturing method | TOSHIBA MEMORY CORPORATION (JP) | 2020-07-21 | — | — | US | disclosed |
| US-20200075315-A1 | SUBSTRATE TREATING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD | TOSHIBA MEMORY CORPORATION (JP) | 2020-03-05 | — | — | US | disclosed |
| US-10541138-B2 | Diffusing agent composition and method of manufacturing semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-01-21 | — | — | US | disclosed |
| US-10504732-B2 | Impurity diffusion agent composition and method for manufacturing semiconductor substrate | TOKYO OHKA KOGYO CO, LTD. (JP) | 2019-12-10 | — | — | US | disclosed |
| EP-1761823-A1 | METHOD OF FORMING PLATED PRODUCT USING NEGATIVE PHOTORESIST COMPOSITION AND PHOTOSENSITIVE COMPOSITION USED THEREIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-03-14 | — | — | EP | disclosed |
| WO-2006059757-A2 | PROCESS FOR PRODUCING RESIST PATTERN AND CONDUCTOR PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-06-08 | — | — | WO | disclosed |
| WO-2006003757-A1 | METHOD OF FORMING PLATED PRODUCT USING NEGATIVE PHOTORESIST COMPOSITION AND PHOTOSENSITIVE COMPOSITION USED THEREIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-01-12 | — | — | WO | disclosed |
| US-6641628-B1 | Plastic particles are acrylonitrile/polyethylene chloride/styrene resin particles | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-11-04 | — | — | US | disclosed |
| EP-0890417-B1 | Method for sandblast processing plasma display panel substrate using a plastic abrasive | TOKYO OHKA KOGYO CO LTD (JP) | 2003-05-07 | — | — | EP | disclosed |
| US-6368195-B1 | Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-04-09 | — | — | US | disclosed |
| US-6268108-B1 | MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-31 | — | — | US | disclosed |
| US-6126513-A | Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-10-03 | — | — | US | disclosed |
| US-6071673-A | Method for the formation of resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-06-06 | — | — | US | disclosed |
| EP-0890417-A1 | Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-01-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10504732-B2 | Impurity diffusion agent composition and method for manufacturing semiconductor substrate | SLC43A1, SAMHD1, SNRPD2 | SLC22A6 185/4885TDP1 943/4885CACNA2D1 3564/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.