SCHEMBL5010102

SCHEMBL5010102

COc1ccc(C(c2ccc(NC(C)Cc3ccccc3)cc2C)c2ccc(NC(C)Cc3ccccc3)cc2C)cc1

nearest known ligand 0.52

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.50
MEN1 O00255 2/20 0.50
L3MBTL1 Q9Y468 3/20 0.45
SIGMAR1 Q99720 1/20 0.44
ALDH1A1 P00352 4/20 0.43
MAPT P10636 2/20 0.43
GAA P10253 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
HTT P42858 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP2D6 P10635 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
FPR2 P25090 1/20 0.40
SLC2A1 P11166 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5011920 0.84 ALDH1A1 (0.44) KMT2AMEN1SIGMAR1ALDH1A1MAPT
SCHEMBL5667990 0.83 G6PD (0.43) KMT2AMEN1L3MBTL1SIGMAR1ALDH1A1
SCHEMBL5011802 0.82 MEN1 (0.46) KMT2AMEN1L3MBTL1SIGMAR1ALDH1A1
SCHEMBL5010105 0.78 LMNA (0.47) KMT2AMEN1L3MBTL1SIGMAR1ALDH1A1
SCHEMBL5009568 0.77 GAA (0.45) KMT2AMEN1SIGMAR1MAPTGAA
SCHEMBL31443249 0.75 MEN1 (0.66) KMT2AMEN1L3MBTL1SIGMAR1ALDH1A1
SCHEMBL5011774 0.74 MEN1 (0.45) KMT2AMEN1L3MBTL1SIGMAR1ALDH1A1
SCHEMBL3905889 0.74 SIGMAR1 (0.54) KMT2AMEN1SIGMAR1ALDH1A1CYP1A2
SCHEMBL7653941 0.73 LMNA (0.38) KMT2AMEN1ALDH1A1MAPTGAA
SCHEMBL11115341 0.72 HTT (0.51) L3MBTL1ALDH1A1MAPTGAAHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080311524-A1 Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor AGFA GRAPHICS N.V. (BE) 2008-12-18 US disclosed
EP-0239868-B1 PHOTOCHROMIC SYSTEM, LAYER PREPARED THEREOF AND ITS USE BASF Aktiengesellschaft (DE) 1989-12-27 EP disclosed
US-4857438-A Photochromic system and layers produced therewith BASF AKTIENGESELLSCHAFT (DE) 1989-08-15 US disclosed
EP-0239868-A1 Photochromic system, layer prepared thereof and its use BASF Aktiengesellschaft (DE) 1987-10-07 EP disclosed
US-4332884-A USING A DIOXIME CHELATING AGENT RICOH CO., LTD. (JP) 1982-06-01 US disclosed
US-4306014-A AMMONIA OR AMINES SUPPRESS THE COLOR-FORMING REACTION SYSTEM RICOH CO., LTD. (JP) 1981-12-15 US disclosed
US-4251619-A Process for forming photo-polymeric image KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1981-02-17 US disclosed