SCHEMBL5015091

SCHEMBL5015091

CCCCCCCCS(=O)(=O)C(N)=O

nearest known ligand 0.48

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CA2 P00918 6/20 0.48
FAAH O00519 6/20 0.48
CES2 O00748 5/20 0.44
CES1 P23141 4/20 0.44
MEN1 O00255 1/20 0.41
TP53 P04637 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2C19 P33261 1/20 0.41
SOAT1 P35610 1/20 0.41
KMT2A Q03164 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4794021 0.98 CA2 (0.45) CA2FAAHCES2CES1MEN1
SCHEMBL4510325 0.79 GPR84 (0.52) FAAHCES2CES1MEN1KMT2A
SCHEMBL8634688 0.78 FAAH (0.48) CA2FAAHCES2CES1
SCHEMBL10917863 0.78 FAAH (0.54) CA2FAAHCES2CES1
SCHEMBL5313008 0.77 CA2 (0.43) CA2FAAHCES2CES1TP53
SCHEMBL3217870 0.77 ENPP2 (0.41) CA2FAAHCES2CES1TP53
SCHEMBL11881585 0.76 AKR1B1 (0.50) FAAHCES2CES1MEN1KMT2A
Hexadecane SCHEMBL27541041 0.74 CES2 (0.58) FAAHCES2CES1MEN1TP53
Decane SCHEMBL31452069 0.74 CES2 (0.58) FAAHCES2CES1MEN1TP53
Dodecane SCHEMBL27584449 0.74 CES2 (0.58) FAAHCES2CES1MEN1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080118867-A1 Pattern Forming Material, Pattern Forming Apparatus, And Pattern Forming Process ASAHI KASEI E-MATERIALS CORPORATION (JP) 2008-05-22 US disclosed
WO-2005109098-A1 PATTERN FORMING MATERIAL, PATTERN FORMING APPARATUS, AND PATTERN FORMING PROCESS FUJI PHOTO FILM CO., LTD. (JP) 2005-11-17 WO disclosed
WO-2005091078-A1 PATTERN FORMING PROCESS AND PATTERN FUJI PHOTO FILM CO., LTD. (JP) 2005-09-29 WO disclosed