SCHEMBL5016154

SCHEMBL5016154

O[SiH](Cc1ccccc1)C1CCCCO1

nearest known ligand 0.39

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.37
RAB9A P51151 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
MGLL Q99685 1/20 0.35
EPHX2 P34913 1/20 0.34
SLC6A3 Q01959 2/20 0.34
HPGD P15428 1/20 0.34
LMNA P02545 1/20 0.34
MEN1 O00255 1/20 0.34
HTT P42858 1/20 0.34
KMT2A Q03164 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4355747 0.83 EPHX2 (0.36) ALDH1A1RAB9ASMN1; SMN2MGLLEPHX2
SCHEMBL16684620 0.81 SLC6A3 (0.34) ALDH1A1RAB9ASMN1; SMN2MGLLSLC6A3
SCHEMBL23294742 0.81 ALDH1A1 (0.35) ALDH1A1RAB9ASMN1; SMN2MGLL
SCHEMBL28774732 0.79 SLC6A3 (0.33) ALDH1A1RAB9ASMN1; SMN2MGLLSLC6A3
SCHEMBL305087 0.78 G6PC1 (0.34) ALDH1A1RAB9ASMN1; SMN2MGLL
SCHEMBL11766465 0.77 TACR1 (0.34) ALDH1A1RAB9ASMN1; SMN2MGLLMEN1
SCHEMBL16684674 0.77 SLC6A3 (0.35) ALDH1A1RAB9ASMN1; SMN2EPHX2SLC6A3
SCHEMBL5024600 0.75 SLC6A3 (0.36) SMN1; SMN2MGLLSLC6A3HPGDMEN1
SCHEMBL16499606 0.74 MAOA (0.33) SLC6A3
SCHEMBL7249559 0.72 MEN1 (0.40) MGLLEPHX2MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7393911-B2 Organosilicon fine particles and method of producing same TAKEMOTO YUSHI KABUSHIKI KAISHA (JP) 2008-07-01 US disclosed
US-20060089478-A1 antireflection and antiblocking characteristics to synthetic polymer films and sheets when applied to their surface or caused to be contained, respectively, and adherence and slip characteristics to a skin care cosmetic material when caused to be contained TAKEMOTO YUSHI KABUSHIKI KAISHA (JP) 2006-04-27 US disclosed