SCHEMBL503161

SCHEMBL503161

CC(C)(C)c1ccc([I+](OS(=O)(=O)CCCC(F)(F)F)c2ccc(C(C)(C)C)cc2)cc1

nearest known ligand 0.34

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 5/20 0.34
CNR1 P21554 2/20 0.34
MEN1 O00255 1/20 0.34
GPR183 P32249 1/20 0.34
KMT2A Q03164 1/20 0.34
CA2 P00918 3/20 0.33
CA1 P00915 2/20 0.33
CA9 Q16790 1/20 0.33
MITF O75030 1/20 0.33
ALDH1A1 P00352 3/20 0.33
TXNRD1 Q16881 1/20 0.32
TP53 P04637 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
MGAT2 Q10469 1/20 0.30
LMNA P02545 1/20 0.30
TYR P14679 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL449583 0.82 HDAC3 (0.39) MEN1KMT2ACA2CA1CA9
SCHEMBL218164 0.79 CA2 (0.41) MEN1KMT2ACA2CA1CA9
SCHEMBL4483668 0.79 CA1 (0.41) MEN1KMT2ACA2CA1CA9
SCHEMBL1802644 0.75 FAAH (0.37) KMT2ACA2CA1CA9
SCHEMBL3794345 0.75 RORA (0.37) CA2CA1CA9ALDH1A1SMN1; SMN2
SCHEMBL565631 0.74 ALDH1A1 (0.36) MEN1KMT2ACA2CA1CA9
SCHEMBL36628 0.74 CA1 (0.40) MEN1KMT2ACA2CA1CA9
SCHEMBL1718943 0.72 CA1 (0.43) MEN1KMT2ACA2CA1CA9
SCHEMBL3828157 0.72 CA1 (0.38) MEN1KMT2ACA2CA1CA9
SCHEMBL3174085 0.72 CA1 (0.38) MEN1KMT2ACA2CA1CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9200098-B2 Radiation-sensitive composition and compound JSR CORPORATION (JP) 2015-12-01 US disclosed
US-8435718-B2 Upper layer-forming composition and photoresist patterning method JSR CORPORATION (JP) 2013-05-07 US disclosed
US-20120164582-A1 RADIATION-SENSITIVE COMPOSITION AND COMPOUND JSR CORPORATION (JP) 2012-06-28 US disclosed
EP-1950610-B1 IMMERSION LITHOGRAPHIC COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN JSR CORP (JP) 2012-05-02 EP disclosed
US-20120028198-A1 UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD JSR CORPORATION (JP) 2012-02-02 US disclosed
US-20110143279-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2011-06-16 US disclosed
US-20100003615-A1 UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD JSR CORPORATION (JP) 2010-01-07 US disclosed
EP-1950610-A1 COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN JSR Corporation (JP) 2008-07-30 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164582-A1 RADIATION-SENSITIVE COMPOSITION AND COMPOUND RAD51, RER1, ATP6AP1 CNR2 1984/4885CNR1 2000/4885MEN1 48/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.