Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | P2RX7 | Q99572 | 7/20 | 0.37 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | CA9 | Q16790 | 1/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | CYP11B1 | P15538 | 1/20 | 0.32 |
| ▸ | CYP11B2 | P19099 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29407108 | 0.87 | — | — | |
| SCHEMBL3785562 | 0.81 | GRIN2D (0.34) | EPHX2CA12CA9CA2 | |
| SCHEMBL10322932 | 0.80 | ALDH1A1 (0.33) | P2RX7EPHX2KMT2ANPC1RAB9A | |
| Carbon Monoxide SCHEMBL544305 | 0.79 | MMP2 (0.31) | SMN1; SMN2 | |
| SCHEMBL544306 | 0.77 | ALDH1A1 (0.43) | KMT2ASMN1; SMN2HSD11B1 | |
| SCHEMBL242790 | 0.77 | P2RX7 (0.36) | P2RX7EPHX2KMT2AMEN1CA12 | |
| SCHEMBL2570105 | 0.77 | P2RX7 (0.36) | P2RX7EPHX2KMT2AMEN1CA12 | |
| SCHEMBL893149 | 0.76 | — | — | |
| SCHEMBL16330887 | 0.74 | P2RX7 (0.40) | P2RX7EPHX2KMT2AMEN1CA12 | |
| SCHEMBL31676706 | 0.73 | ALDH1A1 (0.39) | KMT2AMEN1NPC1RAB9ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 96 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12560866-B2 | Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound | JSR CORPORATION (JP) | 2026-02-24 | — | — | US | disclosed |
| US-12386260-B2 | Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound | JSR CORPORATION (JP) | 2025-08-12 | — | — | US | disclosed |
| US-20220299873-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2022-09-22 | — | — | US | disclosed |
| US-20220229367-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2022-07-21 | — | — | US | disclosed |
| US-20210181627-A1 | PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2021-06-17 | — | — | US | disclosed |
| US-20210063872-A1 | PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2021-03-04 | — | — | US | disclosed |
| EP-3229075-B1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR CORP (JP) | 2021-01-06 | — | — | EP | disclosed |
| US-20200387068-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND COMPOUND | JSR CORPORATION (JP) | 2020-12-10 | — | — | US | disclosed |
| US-20200333707-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION AND PRODUCTION METHOD THEREOF | JSR CORPORATION (JP) | 2020-10-22 | — | — | US | disclosed |
| US-10725376-B2 | Pattern-forming method | JSR CORPORATION (JP) | 2020-07-28 | — | — | US | disclosed |
| US-20120148952-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2012-06-14 | — | — | US | disclosed |
| EP-2444845-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2012-04-25 | — | — | EP | disclosed |
| US-20120082934-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20120082935-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FORMED USING THE SAME | JSR CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20120082936-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20120028189-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20100285405-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-11-11 | — | — | US | disclosed |
| US-20100221659-A1 | COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| EP-1873143-B1 | A salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL CO (JP) | 2009-04-15 | — | — | EP | disclosed |
| EP-1873143-A1 | A salt suitable for an acid generator and a chemically amplified resist composition containing the same | Sumitomo Chemical Company, Limited (JP) | 2008-01-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120148952-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | RAD1, RER1, RPA1 | P2RX7 2884/4885EPHX2 151/4885KMT2A 820/4885 |
| US-20120082934-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND | RER1, RFT1, RAD51 | P2RX7 2086/4885EPHX2 1930/4885KMT2A 2095/4885 |
| US-20100221659-A1 | COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION | AFF1, RER1, AFF4 | P2RX7 3746/4885EPHX2 3205/4885KMT2A 683/4885 |
| US-20120028189-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND | RER1, RAD51, TERB1 | P2RX7 1418/4885EPHX2 619/4885KMT2A 1051/4885 |
| US-20210181627-A1 | PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION | RIF1, AP3M1, MRE11 | P2RX7 4716/4885EPHX2 4652/4885KMT2A 1063/4885 |
| US-12560866-B2 | Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound | RAD51, RER1, RAD1 | P2RX7 2829/4885EPHX2 752/4885KMT2A 2433/4885 |
| US-20220299873-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND | RER1, RAD51, RFT1 | P2RX7 2848/4885EPHX2 1704/4885KMT2A 1452/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.