⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1172103 | 0.81 | MEN1 (0.34) | — | |
| SCHEMBL2677501 | 0.77 | SCN9A (0.31) | — | |
| SCHEMBL515601 | 0.76 | P2RX7 (0.37) | — | |
| SCHEMBL16330888 | 0.74 | HSD11B1 (0.32) | — | |
| SCHEMBL12803488 | 0.73 | — | — | |
| SCHEMBL3119957 | 0.73 | LMNA (0.33) | — | |
| SCHEMBL501411 | 0.72 | GPR3 (0.35) | — | |
| Carbon Monoxide SCHEMBL544305 | 0.72 | MMP2 (0.31) | — | |
| SCHEMBL10322932 | 0.71 | ALDH1A1 (0.33) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL31155703 | 0.71 | GPR3 (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9223207-B2 | Resist pattern-forming method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| US-8921027-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-12-30 | — | — | US | disclosed |
| US-20140363766-A9 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20130295506-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORP (JP) | 2013-11-07 | — | — | US | disclosed |
| US-20120183902-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| EP-2444845-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2012-04-25 | — | — | EP | disclosed |
| US-20120082935-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FORMED USING THE SAME | JSR CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20120082936-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |