SCHEMBL523575

SCHEMBL523575

CC(C)[Si](Cl)(CCc1ccccc1)C(C)C

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.43
NPC1 O15118 2/20 0.42
RAB9A P51151 2/20 0.42
SIGMAR1 Q99720 5/20 0.40
CYP2D6 P10635 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
KMT2A Q03164 1/20 0.40
ALDH1A1 P00352 1/20 0.39
HPGD P15428 1/20 0.39
ALOX15 P16050 1/20 0.39
ALOX12 P18054 1/20 0.39
CASP1 P29466 1/20 0.39
HSD17B10 Q99714 1/20 0.39
MAPK1 P28482 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
AOC3 Q16853 1/20 0.39
TAAR1 Q96RJ0 3/20 0.39
MAOA P21397 1/20 0.39
SLC6A2 P23975 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11414972 0.83 SIGMAR1 (0.43) TDP1NPC1RAB9ASIGMAR1CYP2D6
SCHEMBL6580960 0.82 CA1 (0.31) TAAR1
SCHEMBL11348983 0.76 AOC3 (0.41) TDP1NPC1RAB9ASIGMAR1CYP2D6
SCHEMBL523393 0.76 TDP1 (0.48) TDP1NPC1RAB9ACYP2D6CYP2C9
SCHEMBL523595 0.76 TDP1 (0.48) TDP1NPC1RAB9ACYP2D6CYP2C9
SCHEMBL5804199 0.75 TDP1 (0.48) TDP1NPC1RAB9ASIGMAR1CYP2D6
Toluene SCHEMBL18394201 0.75 LMNA (0.46) TDP1NPC1RAB9ACYP2D6CYP2C9
SCHEMBL208903 0.75 TDP1 (0.52) TDP1NPC1RAB9ASIGMAR1CYP2D6
SCHEMBL1030793 0.75 TDP1 (0.52) TDP1NPC1RAB9ASIGMAR1CYP2D6
SCHEMBL1482295 0.75 TDP1 (0.52) TDP1NPC1RAB9ASIGMAR1CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 134 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12109812-B2 Ink jet printing method and ink jet printing apparatus SEIKO EPSON CORPORATION (JP) 2024-10-08 US disclosed
US-20230256425-A1 INORGANIC POROUS SUBSTRATE, INORGANIC POROUS SUPPORT, AND NUCLEIC ACID PRODUCTION METHOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-08-17 US disclosed
US-20230256425-A1 INORGANIC POROUS SUBSTRATE, INORGANIC POROUS SUPPORT, AND NUCLEIC ACID PRODUCTION METHOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-08-17 US disclosed
CN-114055975-B Ink jet recording method and ink jet recording apparatus 精工爱普生株式会社 2023-05-12 CN disclosed
CN-114055975-A Ink jet recording method and ink jet recording apparatus 精工爱普生株式会社 2022-02-18 CN disclosed
US-20220032618-A1 Ink Jet Printing Method And Ink Jet Printing Apparatus SEIKO EPSON CORPORATION (JP) 2022-02-03 US disclosed
EP-3067395-B1 ULTRAVIOLET RADIATION-CURABLE COMPOSITION, AND RECORDED MATTER SEIKO EPSON CORP (JP) 2020-10-28 EP disclosed
US-10759119-B2 Three dimensional mold object manufacturing apparatus, method for manufacturing three dimensional mold object, and three dimensional mold object SEIKO EPSON CORPORATION (JP) 2020-09-01 US disclosed
US-10392522-B2 Ultraviolet curable composition and recorded object SEIKO EPSON CORPORATION (JP) 2019-08-27 US disclosed
US-10300708-B2 Ink jet composition, housing, and ink jet method SEIKO EPSON CORPORATION (JP) 2019-05-28 US disclosed
US-20090030222-A1 SYSTEMS AND METHODS FOR FUNCTIONALIZING PARTICULATES WITH SILANE-CONTAINING MATERIALS DOW CORNING CORPORATION 2009-01-29 US disclosed
US-20080317943-A1 METHOD FOR FORMING PATTERN, METHOD FOR MANUFACTURING ELECTRO-OPTICAL DEVICE, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE SEIKO EPSON CORPORATION (JP) 2008-12-25 US disclosed
US-20080311285-A1 CONTACT HOLE FORMING METHOD, CONDUCTING POST FORMING METHOD, WIRING PATTERN FORMING METHOD, MULTILAYERED WIRING SUBSTRATE PRODUCING METHOD, ELECTRO-OPTICAL DEVICE PRODUCING METHOD, AND ELECTRONIC APPARATUS PRODUCING METHOD SEIKO EPSON CORPORATION (JP) 2008-12-18 US disclosed
EP-1979422-A2 SYSTEMS AND METHODS FOR FUNCTIONALIZING PARTICULATES SILANE-CONTAINING MATERIALS Dow Corning Corporation (US) 2008-10-15 EP disclosed
WO-2007084245-A2 SYSTEMS AND METHODS FOR FUNCTIONALIZING PARTICULATES SILANE-CONTAINING MATERIALS DOW CORNING CORPORATION (US) 2007-07-26 WO disclosed
US-20060127563-A1 Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device SEIKO EPSON CORPORATION (JP) 2006-06-15 US disclosed
US-20060019034-A1 Process for producing chemical adsorption film and chemical adsorption film SEIKO EPSON CORPORATION (JP) 2006-01-26 US disclosed
US-20050287392-A1 Organic electroluminescent device, method for producing the same, and electronic apparatus SEIKO EPSON CORPORATION (JP) 2005-12-29 US disclosed
CN-1713787-A Organic electroluminescent device, method for producing the same, and electronic apparatus SEIKO EPSON CORP (JP) 2005-12-28 CN disclosed
WO-2005034205-A2 SELF ASSEMBLING NANOPARTICLE-POLYMER HYBRIDS DOW CORNING CORPORATION (US) 2005-04-14 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230256425-A1 INORGANIC POROUS SUBSTRATE, INORGANIC POROUS SUPPORT, AND NUCLEIC ACID PRODUCTION METHOD DNMT3L, FBL, SIK1 TDP1 2812/4885NPC1 77/4885RAB9A 3722/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.