Water

Water

SCHEMBL525370

Cc1cccc2ccccc12.O

nearest known ligand 0.94

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ACHE known ✓ P22303 1/20 0.47
CYP2A6 P11509 8/20 0.94
ALDH1A1 P00352 5/20 0.94
CYP1A2 P05177 9/20 0.63
HSD17B10 Q99714 5/20 0.61
HPGD P15428 4/20 0.61
TSHR P16473 6/20 0.54
TDP1 Q9NUW8 2/20 0.50
CYP3A4 P08684 4/20 0.46
L3MBTL1 Q9Y468 2/20 0.46
KEAP1 Q14145 1/20 0.46
HPRT1 P00492 1/20 0.46
CYP2C19 P33261 1/20 0.43
MAPK1 P28482 1/20 0.43
CASP1 P29466 1/20 0.43
RAB9A P51151 1/20 0.43
CASP7 P55210 1/20 0.43
ATM Q13315 1/20 0.43
HIF1A Q16665 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL27857237 1.00 CYP2A6 (0.94) CYP2A6ALDH1A1CYP1A2HSD17B10HPGD
SCHEMBL10684163 0.97 CYP2A6 (1.00) CYP2A6ALDH1A1CYP1A2HSD17B10HPGD
SCHEMBL3075 0.97 CYP2A6 (1.00) CYP2A6ALDH1A1CYP1A2HSD17B10HPGD
SCHEMBL29903166 0.97 CYP2A6 (1.00) CYP2A6ALDH1A1CYP1A2HSD17B10HPGD
SCHEMBL7517852 0.97 CYP2A6 (1.00) CYP2A6ALDH1A1CYP1A2HSD17B10HPGD
Fluoride SCHEMBL9159854 0.94 CYP2A6 (0.94) CYP2A6ALDH1A1CYP1A2HSD17B10HPGD
Hydrochloric Acid SCHEMBL6705962 0.94 CYP2A6 (0.94) CYP2A6ALDH1A1CYP1A2HSD17B10HPGD
O-Xylene SCHEMBL7050723 0.94 CYP2A6 (0.94) CYP2A6ALDH1A1CYP1A2HSD17B10HPGD
Ammonia Solution, Strong SCHEMBL7539708 0.94 CYP2A6 (0.94) CYP2A6ALDH1A1CYP1A2HSD17B10HPGD
Ammonia Solution, Strong SCHEMBL21796071 0.94 CYP2A6 (0.94) CYP2A6ALDH1A1CYP1A2HSD17B10HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9905414-B2 Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2018-02-27 US disclosed
US-20160268121-A1 VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE PRESIDENT AND FELLOWS OF HARVARD COLLEGE 2016-09-15 US disclosed
US-20160111276-A1 VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE PRESIDENT AND FELLOWS OF HARVARD COLLEGE 2016-04-21 US disclosed
US-20160087066-A1 VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE PRESIDENT AND FELLOWS OF HARVARD COLLEGE 2016-03-24 US disclosed
US-20150118395-A1 Vapor Deposition of Metal Oxides, Silicates and Phosphates, and Silicon Dioxide PRESIDENT AND FELLOWS OF HARVARD COLLEGE 2015-04-30 US disclosed
EP-1327010-B1 VAPOR DEPOSITION OF SILICATES HARVARD COLLEGE (US) 2013-12-04 EP disclosed
US-20130122328-A1 VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2013-05-16 US disclosed
US-8334016-B2 Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2012-12-18 US disclosed
US-20120028478-A1 VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2012-02-02 US disclosed
US-7507848-B2 Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2009-03-24 US disclosed
CN-100425630-C Filming copolymer resin containing silicon coupler and its organic antiflecting coating SUZHOU HUAFEI MICROELECTRONIC (CN) 2008-10-15 CN disclosed
EP-1772534-A2 Tungsten-containing and hafnium-containing precursors for vapor deposition The President and Fellows of Harvard College (US) 2007-04-11 EP disclosed
CN-1847274-A Filming copolymer resin containing silicon coupler and its organic antiflecting coating SUZHOU HUAFEI MICROELECTRONIC (CN) 2006-10-18 CN disclosed
US-20050277780-A1 Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide PRESIDENT AND FELLOWS OF HARVARD COLLEGE 2005-12-15 US disclosed
US-6969539-B2 Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2005-11-29 US disclosed
US-20040043149-A1 Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide PRESIDENT AND FELLOWS OF HARVARD COLLEGE 2004-03-04 US disclosed
EP-1327010-A2 VAPOR DEPOSITION OF OXIDES, SILICATES AND PHOSPHATES PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2003-07-16 EP disclosed
WO-2002027063-A2 VAPOR DEPOSITION OF OXIDES, SILICATES AND PHOSPHATES PRESIDENT AND FELLOWS OF HARWARD COLLEGE (US) 2002-04-04 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050277780-A1 Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide TERT, TAF5, TAOK3 ACHE 1978/4885CYP2A6 4264/4885ALDH1A1 4059/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.