SCHEMBL533420

SCHEMBL533420

C=C(C(=O)OCCO)C(C=CC#N)C=Cc1ccccc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1B10 O60218 2/20 0.35
AKR1B1 P15121 2/20 0.35
LMNA P02545 1/20 0.34
ALDH1A1 P00352 4/20 0.33
CYP1A2 P05177 1/20 0.33
MAPT P10636 1/20 0.32
RECQL P46063 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
CNR2 P34972 1/20 0.32
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
CYP3A4 P08684 1/20 0.32
CTSL P07711 1/20 0.31
POLB P06746 1/20 0.31
CTSC P53634 1/20 0.31
APP P05067 1/20 0.31
CTDSP1 Q9GZU7 1/20 0.31
MAOB P27338 1/20 0.30
CASP1 P29466 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methoxymethane SCHEMBL17812950 0.97 ALDH1A1 (0.34) AKR1B10AKR1B1LMNAALDH1A1CYP1A2
SCHEMBL437822 0.89 AKR1B10 (0.36) AKR1B10AKR1B1LMNAALDH1A1MAPT
SCHEMBL544657 0.83 TDP1 (0.38) LMNAALDH1A1CYP1A2SMN1; SMN2TDP1
SCHEMBL3630361 0.81 MGLL (0.47) ALDH1A1
SCHEMBL1425048 0.81 CYP1A2 (0.41) LMNAALDH1A1CYP1A2MAPTRECQL
Butadiene SCHEMBL11122770 0.80 TDP1 (0.36) LMNAALDH1A1CYP1A2SMN1; SMN2TDP1
SCHEMBL10932584 0.77 LMNA (0.38) LMNAALDH1A1CYP1A2MAPTTDP1
Butadiene SCHEMBL5050055 0.76 TSHR (0.40) AKR1B10AKR1B1LMNAALDH1A1SMN1; SMN2
SCHEMBL441192 0.75 POLB (0.38) AKR1B10AKR1B1LMNAALDH1A1MAPT
SCHEMBL1533140 0.75 LMNA (0.41) AKR1B10AKR1B1LMNAALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 164 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0558262-B1 Low gloss polycarbonate/ABS blends GEN ELECTRIC (US) 1998-08-05 EP claimed
US-5310791-A Reduced surface gloss; molding resins GENERAL ELECTRIC COMPANY (US) 1994-05-10 US claimed
EP-0558262-A1 Low gloss polycarbonate/ABS blends GENERAL ELECTRIC COMPANY (US) 1993-09-01 EP claimed
US-11633948-B2 Method for making lithographic printing plates EASTMAN KODAK COMPANY (US) 2023-04-25 US disclosed
US-20210221116-A1 METHOD FOR MAKING LITHOGRAPHIC PRINTING PLATES BANK OF AMERICA, N.A., AS AGENT 2021-07-22 US disclosed
EP-3052987-B1 NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR EASTMAN KODAK CO (US) 2021-04-21 EP disclosed
EP-2758834-B1 NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS EASTMAN KODAK CO (US) 2021-02-24 EP disclosed
EP-2962157-B1 LITHOGRAPHIC PRINTING PLATE PRECURSORS AND USE EASTMAN KODAK CO (US) 2020-08-12 EP disclosed
EP-2920648-B1 NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR EASTMAN KODAK CO (US) 2018-12-19 EP disclosed
EP-3191895-B1 METHOD FOR MAKING LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK CO (US) 2018-06-27 EP disclosed
EP-3191895-A1 METHOD FOR MAKING LITHOGRAPHIC PRINTING PLATES Eastman Kodak Company (US) 2017-07-19 EP disclosed
US-20090004595-A1 INITIATOR COMPOSITIONS, NEGATIVE-WORKING IMAGEABLE ELEMENTS, AND METHODS OF USE CITICORP NORTH AMERICA, INC., AS AGENT 2009-01-01 US disclosed
WO-2008156552-A1 ON-PRESS DEVELOPABLE NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE EASTMAN KODAK COMPANY (US) 2008-12-24 WO disclosed
US-20080311520-A1 ON-PRESS DEVELOPABLE NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE EASTMAN KODAK COMPANY 2008-12-18 US disclosed
WO-2008150441-A1 IMAGEABLE ELEMENTS AND METHODS OF USE IN NEGATIVE WORKING LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK COMPANY (US) 2008-12-11 WO disclosed
US-20080299488-A1 Imagable layer, polyvinyl alcohol protective overcoarting on hydrophilic substrate; including an infrared sensitive cyanine dyes ; antifogging by white light; high speed images BANK OF AMERICA, N.A., AS AGENT 2008-12-04 US disclosed
WO-2008140726-A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE EASTMAN KODAK COMPANY (US) 2008-11-20 WO disclosed
US-20080280229-A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE CITICORP NORTH AMERICA, INC., AS AGENT 2008-11-13 US disclosed
WO-2008127549-A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE EASTMAN KODAK COMPANY (US) 2008-10-23 WO disclosed
US-20080254387-A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE EASTMAN KODAK COMPANY 2008-10-16 US disclosed