Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SSTR4 | P31391 | 3/20 | 0.38 |
| ▸ | REN | P00797 | 11/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7288516 | 0.95 | NAAA (0.38) | SSTR4REN | |
| SCHEMBL19548051 | 0.89 | REN (0.36) | SSTR4RENALDH1A1LMNAPOLB | |
| SCHEMBL27643591 | 0.84 | ALDH1A1 (0.40) | ALDH1A1LMNAPOLBSMN1; SMN2RAB9A | |
| SCHEMBL1552963 | 0.84 | SSTR4 (0.41) | SSTR4REN | |
| SCHEMBL30771989 | 0.84 | SSTR4 (0.41) | SSTR4REN | |
| Hydrochloric Acid SCHEMBL19118556 | 0.83 | MAPT (0.42) | SSTR4REN | |
| SCHEMBL3043061 | 0.77 | ALDH1A1 (0.48) | ALDH1A1LMNAPOLBSMN1; SMN2RAB9A | |
| SCHEMBL338399 | 0.77 | ALDH1A1 (0.48) | ALDH1A1LMNAPOLBSMN1; SMN2RAB9A | |
| SCHEMBL7257142 | 0.76 | RAB9A (0.54) | ALDH1A1LMNAPOLBSMN1; SMN2RAB9A | |
| SCHEMBL17361189 | 0.76 | RAB9A (0.54) | ALDH1A1LMNAPOLBSMN1; SMN2RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230234939-A1 | IMIDAZOLE-PYRAZOLE DERIVATIVES AS ANTIBACTERIALS | HOFFMANN-LA ROCHE INC. (US) | 2023-07-27 | — | — | US | disclosed |
| EP-2609468-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM Corporation (JP) | 2013-07-03 | — | — | EP | disclosed |
| WO-2013065878-A1 | METHOD OF FORMING PATTERN AND COMPOSITION FOR CROSSLINKED LAYER FORMATION TO BE USED IN THE METHOD | FUJIFILM CORPORATION (JP) | 2013-05-10 | — | — | WO | disclosed |
| EP-2521941-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM | FUJIFILM Corporation (JP) | 2012-11-14 | — | — | EP | disclosed |
| EP-2486452-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM Corporation (JP) | 2012-08-15 | — | — | EP | disclosed |
| WO-2012026622-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | WO | disclosed |
| EP-2414896-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM Corporation (JP) | 2012-02-08 | — | — | EP | disclosed |
| WO-2012002519-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | WO | disclosed |
| WO-2011102546-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-08-25 | — | — | WO | disclosed |
| WO-2011087144-A1 | PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-07-21 | — | — | WO | disclosed |
| WO-2011083872-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-07-14 | — | — | WO | disclosed |
| WO-2011043481-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-04-14 | — | — | WO | disclosed |
| WO-2010114107-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230234939-A1 | IMIDAZOLE-PYRAZOLE DERIVATIVES AS ANTIBACTERIALS | CYP3A7, NISCH, ARG1 | SSTR4 2121/4885REN 224/4885ALDH1A1 1713/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.