Known targets — ChEMBL curated mechanism
ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Fluoride Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride Ion SCHEMBL14335501 | 0.87 | — | — | |
| Fluoride Ion SCHEMBL775334 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL28698761 | 0.82 | CA4 (0.50) | — | |
| Fluoride Ion SCHEMBL2785839 | 0.82 | CA4 (0.50) | — | |
| Fluoride Ion SCHEMBL1782157 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL3823213 | 0.82 | — | — | |
| Fluoride Ion F-18 SCHEMBL29392639 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL29203899 | 0.82 | CA4 (0.50) | — | |
| Fluoride Ion SCHEMBL2348 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL27849659 | 0.82 | CA4 (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240260575-A1 | AGRICULTURAL AND HORTICULTURAL FUNGICIDAL COMPOSITION | NIPPON SODA CO., LTD. (JP) | 2024-08-08 | — | — | US | claimed |
| EP-4344545-A1 | AGRICULTURAL AND HORTICULTURAL FUNGICIDAL COMPOSITION | Nippon Soda Co., Ltd. (JP) | 2024-04-03 | — | — | EP | claimed |
| US-20060237124-A1 | Method for producing printed retroreflective high visibility products | INDUSTRIA BERGAMASCA RIFRANGENTI S.R.L. (IT) | 2006-10-26 | — | — | US | claimed |
| EP-1468619-B1 | Method for producing printed retroreflective high visibility products | IND BERGAMASCA RIFRANGENTI S R (IT) | 2006-10-18 | — | — | EP | claimed |
| WO-2004091329-A1 | METHOD FOR PRODUCING PRINTED RETROREFLECTIVE HIGH VISIBILITY PRODUCTS | INDUSTRIA BERGAMASCA RIFRANGENTI S.R.L. (IT) | 2004-10-28 | — | — | WO | claimed |
| EP-1468619-A1 | Method for producing printed retroreflective high visibility products | Industria Bergamasca Rifrangenti S.r.l. (IT) | 2004-10-20 | — | — | EP | claimed |
| EP-0333084-B1 | Method for preparing gaseous fluorides | MITSUI TOATSU CHEMICALS (JP) | 1994-07-27 | — | — | EP | claimed |
| EP-0543009-B1 | PROCESS FOR PURIFYING NITROGEN TRIFLUORIDE GAS | MITSUI TOATSU CHEMICALS (JP) | 1994-06-08 | — | — | EP | claimed |
| US-5243458-A | Silicon or germanium substrate having formed thereon a multilayer interference coating | MINOLTA CAMERA KABUSHIKI KAISHA (JP) | 1993-09-07 | — | — | US | claimed |
| EP-0337294-B1 | PROCESS FOR PURIFYING NITROGEN TRIFLUORIDE GAS | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1993-06-30 | — | — | EP | claimed |
| EP-0543009-A1 | PROCESS FOR PURIFYING NITROGEN TRIFLUORIDE GAS | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1993-05-26 | — | — | EP | claimed |
| US-5183647-A | Decomposing impurities dinitrogen difluoride in specified vessel it's wall surface is covered with passive film nickle fluide | MITSUI TOATSU CHEMICALS, INC. (JP) | 1993-02-02 | — | — | US | claimed |
| US-4960581-A | REACTING METAL OR METAL OXIDE WITH FLUORINE GAS OR NITROGEN TRIFLUORIDE; SOLID METAL FLUORIDE AS MOLDING AUXILIARY | MITSUI TOATSU CHEMICALS, INC. (JP) | 1990-10-02 | — | — | US | claimed |
| US-4948571-A | HEATING IN METALLIC VESSEL LINED WITH SOLID FLUORIDE | MITSUI TOATSU CHEMICALS, INC. (JP) | 1990-08-14 | — | — | US | claimed |
| EP-0337294-A2 | Process for purifying nitrogen trifluoride gas | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-10-18 | — | — | EP | claimed |
| EP-0333084-A2 | Method for preparing gaseous fluorides | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-09-20 | — | — | EP | claimed |
| US-4173518-A | Electrodes for aluminum reduction cells | SUMITOMO ALUMINUM SMELTING COMPANY, LIMITED (JP) | 1979-11-06 | — | — | US | claimed |
| US-4039401-A | Aluminum production method with electrodes for aluminum reduction cells | SUMITOMO CHEMICAL COMPANY, LIMITED (JA) | 1977-08-02 | — | — | US | claimed |
| JP-54148193-A | — | — | None | — | — | JP | disclosed |
| US-3953219-A | USED TO MAKE STEEL INGOTS, CARBONIZED PLANT MATERIAL, REFRACTORIES, METAL OXIDES | AIKOH CO., LTD. (JA) | 1976-04-27 | — | — | US | disclosed |