SCHEMBL546306

SCHEMBL546306

CC(C)(C)c1ccc(S(OS(=O)(=O)C(F)(F)C(=O)OCCCCCCCCI)(c2ccc(F)cc2)c2ccc(C(C)(C)C)cc2)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 3/20 0.37
SMN1; SMN2 Q16637 4/20 0.35
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
MAPT P10636 2/20 0.33
NPC1 O15118 1/20 0.33
XBP1 P17861 1/20 0.33
MAPK1 P28482 1/20 0.33
HTT P42858 1/20 0.33
RAB9A P51151 1/20 0.33
TP53 P04637 3/20 0.33
LMNA P02545 1/20 0.33
PTGER2 P43116 2/20 0.33
GPR183 P32249 1/20 0.32
RORA P35398 1/20 0.32
RORC P51449 3/20 0.31
MOGAT2 Q3SYC2 2/20 0.31
ABCC9 O60706 1/20 0.31
ABCC8 Q09428 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547272 0.92 ALDH1A1 (0.37) HSD11B1MEN1KMT2AMAPTNPC1
SCHEMBL547032 0.89 HSD11B1 (0.34) HSD11B1LMNAALDH1A1
SCHEMBL547299 0.89 HSD11B1 (0.34) HSD11B1LMNAALDH1A1
SCHEMBL546477 0.89 HSD11B1 (0.34) HSD11B1LMNAALDH1A1
SCHEMBL546510 0.85 MEN1 (0.35) SMN1; SMN2MEN1KMT2AMAPTTP53
SCHEMBL546641 0.85 LMNA (0.34) SMN1; SMN2MEN1KMT2AMAPTNPC1
SCHEMBL546341 0.82 HDAC1 (0.34) SMN1; SMN2MEN1KMT2AMAPTMAPK1
SCHEMBL547114 0.82 HDAC1 (0.34) SMN1; SMN2MEN1KMT2AMAPTMAPK1
SCHEMBL546831 0.82 CA1 (0.34) HSD11B1MEN1KMT2ALMNAABCC9
SCHEMBL546513 0.82 PTPN1 (0.34) HSD11B1MEN1KMT2ALMNAABCC9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed