Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | BLM | P54132 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | GABRA1 | P14867 | 4/20 | 0.43 |
| ▸ | GABRB2 | P47870 | 4/20 | 0.43 |
| ▸ | PIM1 | P11309 | 1/20 | 0.41 |
| ▸ | PIM3 | Q86V86 | 1/20 | 0.41 |
| ▸ | KCNJ1 | P48048 | 1/20 | 0.41 |
| ▸ | ERN1 | O75460 | 3/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | TLR2 | O60603 | 1/20 | 0.37 |
| ▸ | TLR1 | Q15399 | 1/20 | 0.37 |
| ▸ | TLR6 | Q9Y2C9 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8981378 | 0.86 | ALDH1A1 (0.42) | ALDH1A1TSHRMEN1LMNATHRB | |
| SCHEMBL28323985 | 0.83 | LIPG (0.40) | ALDH1A1TSHRMEN1LMNATHRB | |
| SCHEMBL2451551 | 0.81 | ALDH1A1 (0.59) | ALDH1A1TSHRMEN1LMNATHRB | |
| SCHEMBL16960918 | 0.81 | GABRA1 (0.46) | GABRA1GABRB2 | |
| SCHEMBL110775 | 0.81 | GABRA1 (0.41) | ALDH1A1TSHRMEN1LMNAKMT2A | |
| SCHEMBL12760683 | 0.80 | ALDH1A1 (0.41) | ALDH1A1TSHRMEN1LMNATHRB | |
| SCHEMBL7178270 | 0.80 | SRC (0.39) | ALDH1A1TSHRMEN1LMNATHRB | |
| SCHEMBL14877391 | 0.80 | MEN1 (0.46) | ALDH1A1TSHRMEN1LMNATHRB | |
| SCHEMBL224815 | 0.79 | LMNA (0.57) | ALDH1A1TSHRMEN1LMNATHRB | |
| SCHEMBL29897321 | 0.79 | LMNA (0.57) | ALDH1A1TSHRMEN1LMNATHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108008600-B | Radiation-sensitive composition | 三菱瓦斯化学株式会社 | 2021-02-09 | — | — | CN | disclosed |
| US-10889555-B2 | Sulfonamide compound or salt thereof | TAIHO PHARMACEUTICAL CO., LTD. (JP) | 2021-01-12 | — | — | US | disclosed |
| US-20200405697-A1 | Antitumor Agent | TAIHO PHARMACEUTICAL CO., LTD. (JP) | 2020-12-31 | — | — | US | disclosed |
| US-20200399235-A1 | Sulfonamide Compound or Salt Thereof | TAIHO PHARMACEUTICAL CO., LTD. (JP) | 2020-12-24 | — | — | US | disclosed |
| EP-3718545-A1 | ANTITUMOR AGENT | Taiho Pharmaceutical Co., Ltd. (JP) | 2020-10-07 | — | — | EP | disclosed |
| EP-2080750-B1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-07-29 | — | — | EP | disclosed |
| US-20200157066-A1 | Sulfonamide Compound or Salt Thereof | TAIHO PHARMACEUTICAL CO., LTD. (JP) | 2020-05-21 | — | — | US | disclosed |
| CN-104281006-B | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2019-01-22 | — | — | CN | disclosed |
| CN-108008600-A | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2018-05-08 | — | — | CN | disclosed |
| US-9897913-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-02-20 | — | — | US | disclosed |
| EP-2474518-A1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-07-11 | — | — | EP | disclosed |
| EP-2474538-A1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-07-11 | — | — | EP | disclosed |
| EP-2474565-A1 | CYCLIC COMPOUND, MANUFACTURING METHOD THEREFOR, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING A RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-07-11 | — | — | EP | disclosed |
| US-20120171379-A1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20120171615-A1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20120164575-A1 | CYCLIC COMPOUND, MANUFACTURING METHOD THEREFOR, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING A RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-06-28 | — | — | US | disclosed |
| US-20120156615-A1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-06-21 | — | — | US | disclosed |
| US-8110334-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-02-07 | — | — | US | disclosed |
| US-20100047709-A1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2010-02-25 | — | — | US | disclosed |
| EP-2080750-A1 | RADIATION-SENSITIVE COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2009-07-22 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (9 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200399235-A1 | Sulfonamide Compound or Salt Thereof | RNASEH1, SNRPA1, RRM2 | ALDH1A1 1103/4885TSHR 840/4885MEN1 4320/4885 |
| US-20200157066-A1 | Sulfonamide Compound or Salt Thereof | RNASEH1, SNRPA1, RRM2 | ALDH1A1 1103/4885TSHR 840/4885MEN1 4320/4885 |
| US-20120171379-A1 | RADIATION-SENSITIVE COMPOSITION | PARG, RAD51, SRMS | ALDH1A1 4594/4885TSHR 3414/4885MEN1 1441/4885 |
| US-10889555-B2 | Sulfonamide compound or salt thereof | RNASEH1, SNRPA1, RRM2 | ALDH1A1 1103/4885TSHR 840/4885MEN1 4320/4885 |
| US-20100047709-A1 | RADIATION-SENSITIVE COMPOSITION | C1S, C9, RAD51 | ALDH1A1 1078/4885TSHR 3709/4885MEN1 1910/4885 |
| US-20120156615-A1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | RAD1, CCNE1, CCNA1 | ALDH1A1 1357/4885TSHR 668/4885MEN1 400/4885 |
| US-20120171615-A1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | RAD1, CCNE1, CCNA1 | ALDH1A1 1357/4885TSHR 668/4885MEN1 400/4885 |
| US-20200405697-A1 | Antitumor Agent | HNRNPR, RRM2, RRM2B | ALDH1A1 1397/4885TSHR 284/4885MEN1 3770/4885 |
| US-20120164575-A1 | CYCLIC COMPOUND, MANUFACTURING METHOD THEREFOR, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING A RESIST PATTERN | WEE1, SLC11A2, RAD1 | ALDH1A1 816/4885TSHR 1904/4885MEN1 59/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.