Known targets — ChEMBL curated mechanism
DHFRGARTPTGFRPTGIRPTGS1PTGS2TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8envmurAthyA
The experimentally established mechanism targets of Tromethamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tromethamine SCHEMBL5176238 | 0.82 | MEN1 (0.42) | MEN1LMNAKMT2AHSP90AA1 | |
| SCHEMBL251722 | 0.80 | HSP90AA1 (0.38) | HSP90AA1 | |
| SCHEMBL27830398 | 0.78 | HSP90AA1 (0.36) | HSP90AA1 | |
| Piperazine SCHEMBL28115339 | 0.68 | — | — | |
| SCHEMBL28146724 | 0.67 | HSP90AA1 (0.38) | HSP90AA1 | |
| SCHEMBL11741461 | 0.65 | HSP90AA1 (0.32) | HSP90AA1 | |
| Tromethamine SCHEMBL14735910 | 0.64 | MEN1 (0.83) | MEN1LMNAKMT2A | |
| Tromethamine SCHEMBL975 | 0.63 | — | — | |
| Tromethamine SCHEMBL3696191 | 0.63 | — | — | |
| Tromethamine SCHEMBL17484 | 0.63 | MEN1 (1.00) | MEN1LMNAKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111435220-B | Photosensitive resin composition, optical film, and method for producing same | 新应材股份有限公司 | 2024-02-27 | — | — | CN | disclosed |
| CN-116203800-B | Photosensitive resin composition containing polysiloxane | 上海玟昕科技有限公司 | 2023-08-25 | — | — | CN | disclosed |
| CN-114442431-B | Photosensitive resin composition containing polyimide precursor | 上海玟昕科技有限公司 | 2023-08-04 | — | — | CN | disclosed |
| CN-116203800-A | Photosensitive resin composition containing polysiloxane | 上海玟昕科技有限公司 | 2023-06-02 | — | — | CN | disclosed |
| CN-115808845-A | Photosensitive resin composition, optical film and method for producing same | 新应材股份有限公司 | 2023-03-17 | — | — | CN | disclosed |
| CN-115480447-A | Negative photosensitive resin composition | DIC株式会社 | 2022-12-16 | — | — | CN | disclosed |
| CN-114442431-A | Photosensitive resin composition containing polyimide precursor | 上海玟昕科技有限公司 | 2022-05-06 | — | — | CN | disclosed |
| CN-114397797-A | Negative photoresist composition containing nano particles | 上海玟昕科技有限公司 | 2022-04-26 | — | — | CN | disclosed |
| CN-112162463-B | Negative high-elasticity photosensitive resin composition | 上海玟昕科技有限公司 | 2021-09-28 | — | — | CN | disclosed |
| CN-112180681-B | Negative low-temperature curing type photosensitive resin composition | 上海玟昕科技有限公司 | 2021-07-09 | — | — | CN | disclosed |
| US-20040265737-A1 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |
| CN-1554959-A | Light sensitive resin composition for color filter | 奇美实业股份有限公司 | 2004-12-15 | — | — | CN | disclosed |
| CN-1529206-A | Light-sensitive resin composition for colour filter film | 奇美实业股份有限公司 | 2004-09-15 | — | — | CN | disclosed |
| CN-1144096-C | Photosensitive resin composition | 奇美实业股份有限公司 | 2004-03-31 | — | — | CN | disclosed |
| CN-1126005-C | Photosensitive resin composition | QIMEI IND CO LTD (CN) | 2003-10-29 | — | — | CN | disclosed |
| CN-1412234-A | Photosensitive resin composite for gap body of liquid crystal display | QIMEI IND CO LTD (CN) | 2003-04-23 | — | — | CN | disclosed |
| CN-1311458-A | Photosensitive resin composition | QIMEI IND CO LTD (CN) | 2001-09-05 | — | — | CN | disclosed |
| CN-1301993-A | Photosensitive resin composition | QIMEI IND CO LTD (CN) | 2001-07-04 | — | — | CN | disclosed |
| EP-0652483-B1 | Lithographic printing plates | MINNESOTA MINING & MFG (US) | 1998-05-13 | — | — | EP | disclosed |
| EP-0652483-A1 | Lithographic printing plates | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1995-05-10 | — | — | EP | disclosed |