SCHEMBL5493502

SCHEMBL5493502

Cl[Si](Cl)(Cl)CCc1ccc(-c2ccccc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FFAR1 O14842 1/20 0.48
TAAR1 Q96RJ0 2/20 0.46
HIF1A Q16665 3/20 0.45
KCNH2 Q12809 1/20 0.44
MMP12 P39900 5/20 0.43
IDO1 P14902 2/20 0.42
AGXT P21549 2/20 0.42
ABCC4 O15439 1/20 0.42
LMNA P02545 1/20 0.42
GAA P10253 1/20 0.42
TSHR P16473 1/20 0.42
PTGS1 P23219 1/20 0.42
HTT P42858 1/20 0.42
MMP13 P45452 4/20 0.42
CYP17A1 P05093 1/20 0.42
CYP11B1 P15538 1/20 0.42
CYP11B2 P19099 1/20 0.42
CNR2 P34972 1/20 0.41
FAAH O00519 1/20 0.41
MGLL Q99685 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5483434 0.88 FFAR1 (0.46) FFAR1TAAR1HIF1AKCNH2MMP12
SCHEMBL2861031 0.87 MAOB (0.39) FFAR1TAAR1HIF1AKCNH2MMP12
SCHEMBL2864709 0.87 FFAR1 (0.38) FFAR1TAAR1HIF1AKCNH2MMP12
SCHEMBL208903 0.86 TDP1 (0.52) TAAR1KCNH2IDO1LMNATSHR
SCHEMBL6532094 0.84 TDP1 (0.50) TAAR1KCNH2IDO1LMNATSHR
SCHEMBL6848455 0.83 CA2 (0.38) TAAR1IDO1CYP1A2
SCHEMBL5486120 0.82 AGXT (0.47) HIF1AAGXTCYP11B1CYP11B2
SCHEMBL2867796 0.82 TP53 (0.35) FFAR1HIF1AHTTCYP1A2
SCHEMBL5488841 0.78 FFAR1 (0.53) FFAR1TSHR
SCHEMBL5494552 0.77 TAAR1 (0.50) FFAR1TAAR1IDO1AGXTABCC4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7291747-B2 Silicon compounds and process for preparation thereof CHISSO CORPORATION (JP) 2007-11-06 US disclosed
US-20040143081-A1 Novel silicon compounds and process for preparation thereof JNC CORPORATION (JP) 2004-07-22 US disclosed