Iodide

Iodide

SCHEMBL5500973

CCN1/C(=C\C(C)=C\c2sc3ccccc3[n+]2CC)Sc2ccccc21.[I-]

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG

The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 5/20 1.00
▸ KMT2A Q03164 5/20 1.00
▸ HTT P42858 5/20 1.00
▸ NPC1 O15118 4/20 1.00
▸ RAB9A P51151 4/20 1.00
▸ BLM P54132 4/20 1.00
▸ MAPT P10636 4/20 1.00
▸ ALDH1A1 P00352 4/20 1.00
▸ APAF1 O14727 2/20 1.00
▸ POLB P06746 2/20 1.00
▸ THRB P10828 2/20 1.00
▸ PKM P14618 2/20 1.00
▸ RECQL P46063 2/20 1.00
▸ SMN1; SMN2 Q16637 2/20 1.00
▸ NPSR1 Q6W5P4 2/20 1.00
▸ TDP1 Q9NUW8 2/20 1.00
▸ PLA2G1B P04054 1/20 1.00
▸ MAPK1 P28482 1/20 1.00
▸ CDK5 Q00535 1/20 1.00
▸ CDK5R1 Q15078 1/20 1.00

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Iodide SCHEMBL145356 1.00 MEN1 (1.00) MEN1KMT2AHTTNPC1RAB9A
Iodide SCHEMBL145357 1.00 MEN1 (1.00) MEN1KMT2AHTTNPC1RAB9A
SCHEMBL29349411 0.99 NSD2 (1.00) MEN1KMT2AHTTNPC1RAB9A
SCHEMBL2409472 0.99 NSD2 (1.00) MEN1KMT2AHTTNPC1RAB9A
SCHEMBL10035965 0.99 NSD2 (1.00) MEN1KMT2AHTTNPC1RAB9A
SCHEMBL6426499 0.99 NSD2 (1.00) MEN1KMT2AHTTNPC1RAB9A
Bromide SCHEMBL29362921 0.98 NSD2 (0.98) MEN1KMT2AHTTNPC1RAB9A
Bromide SCHEMBL9192803 0.98 NSD2 (0.98) MEN1KMT2AHTTNPC1RAB9A
Hydrochloric Acid SCHEMBL9015126 0.98 NSD2 (0.98) MEN1KMT2AHTTNPC1RAB9A
Iodide SCHEMBL7697694 0.90 MEN1 (0.81) MEN1KMT2AHTTNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1263590-B1 THERMALLY IMAGEABLE ELEMENT AND LITHOGRAPHIC PRINTING PLATE KODAK POLYCHROME GRAPHICS CO (US) 2005-03-16 — — EP claimed
EP-1263590-A2 THERMALLY IMAGEABLE ELEMENT AND LITHOGRAPHIC PRINTING PLATE Kodak Polychrome Graphics Company Ltd. (US) 2002-12-11 — — EP claimed
US-6352811-B1 POSITIVE-WORKING THERMAL IMAGING ELEMENT COMPRISING SUBSTRATE, THERMALLY SENSITIVE COMPOSITE STRUCTURE HAVING FIRST LAYER OF POLYMER WHICH IS SOLUBLE OR DISPERSIBLE IN AQUEOUS SOLUTION AND SOLUBILITY INHIBITOR, SECOND LAYER OF INSOLUBLE POLYMER KODAK POLYCHROME GRAPHICS LLC 2002-03-05 — — US claimed
US-6342329-B1 Image-forming medium BROTHER KOGYO KABUSHIKI KAISHA (JP) 2002-01-29 — — US claimed
WO-2001045958-A2 THERMALLY IMAGEABLE ELEMENT AND LITHOGRAPHIC PRINTING PLATE KODAK POLYCHROME GRAPHICS COMPANY LTD (US) 2001-06-28 — — WO claimed
US-7279263-B2 Dual-wavelength positive-working radiation-sensitive elements KODAK GRAPHIC COMMUNICATIONS CANADA COMPANY (CA) 2007-10-09 — — US disclosed
US-20050287468-A1 Dual-wavelength positive-working radiation-sensitive elements KODAK GRAPHIC COMMUNICATIONS CANADA COMPANY (CA) 2005-12-29 — — US disclosed
EP-1542871-A1 METHOD FOR MAKING PRINTING PLATE BY INKJET DEPOSITION ON POSITIVE-WORKING MEDIA Creo SRL (CA) 2005-06-22 — — EP disclosed
US-6905812-B2 Positive working; heat sensitive element; phenol-formaldehyde resin KODAK POLYCHROME GRAPHICS LLC (US) 2005-06-14 — — US disclosed
EP-1263590-B1 THERMALLY IMAGEABLE ELEMENT AND LITHOGRAPHIC PRINTING PLATE KODAK POLYCHROME GRAPHICS CO (US) 2005-03-16 — — EP disclosed
US-6739260-B2 Method for the preparation of a negative working printing plate AGFA-GEVAERT (BE) 2004-05-25 — — US disclosed
US-20040038152-A1 Method for making printing plate by inkjet deposition on positive-working media CREO SRL (CA) 2004-02-26 — — US disclosed
EP-1123212-B1 METHOD FOR MANUFACTURE OF ELECTRONIC PARTS KODAK POLYCHROME GRAPHICS CO (US) 2002-08-21 — — EP disclosed
EP-0887182-B1 Heat-sensitive composition for making a lithographic printing form precursor KODAK POLYCHROME GRAPHICS CO (US) 2002-07-24 — — EP disclosed
US-6423456-B1 COATING WITH HEAT SENSITIVE AQUEOUS DEVELOPER COMPRISING VINYLPHENOL DERIVATIVE-(HYDROXY)ALKYL (METH)ACRYLATE COPOLYMER; PRINTED CIRCUITS KODAK POLYCHROME GRAPHICS LLC 2002-07-23 — — US disclosed
US-20020045124-A1 Aqueous developer soluble polymer, such as a phenolic resin; a compound that reduces the aqueous developer solubility of the polymer such as quaternized nitrogen atom, such as quinolinium compounds and benzothiazolium compounds LASER PACIFIC MEDIA CORPORATION 2002-04-18 — — US disclosed
US-6352811-B1 POSITIVE-WORKING THERMAL IMAGING ELEMENT COMPRISING SUBSTRATE, THERMALLY SENSITIVE COMPOSITE STRUCTURE HAVING FIRST LAYER OF POLYMER WHICH IS SOLUBLE OR DISPERSIBLE IN AQUEOUS SOLUTION AND SOLUBILITY INHIBITOR, SECOND LAYER OF INSOLUBLE POLYMER KODAK POLYCHROME GRAPHICS LLC 2002-03-05 — — US disclosed
US-6342329-B1 Image-forming medium BROTHER KOGYO KABUSHIKI KAISHA (JP) 2002-01-29 — — US disclosed
EP-0825927-B1 LITHOGRAPHIC PRINTING FORM PRECURSOR AND ITS USE BY HEAT IMAGING KODAK POLYCHROME GRAPHICS CO (US) 1999-08-11 — — EP disclosed
EP-0930539-A1 Image-forming medium BROTHER KOGYO KABUSHIKI KAISHA (JP) 1999-07-21 — — EP disclosed
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