SCHEMBL5608693

SCHEMBL5608693

CC(C)(C)c1ccc(C2(C)CCOC2=O)cc1

nearest known ligand 0.42

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.35
MGAT2 Q10469 1/20 0.35
HSD11B1 P28845 1/20 0.34
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7034683 0.81 CCR2 (0.40)
SCHEMBL576440 0.79 MMP2 (0.40) ALDH1A1HSD11B1TSHR
SCHEMBL14350785 0.79 MMP2 (0.40) ALDH1A1HSD11B1TSHR
SCHEMBL7034677 0.75 POLB (0.40) ALDH1A1HSD11B1
SCHEMBL296831 0.72 CCR2 (0.49)
SCHEMBL7038682 0.71 SLC6A4 (0.44)
SCHEMBL7033227 0.70 LMNA (0.44) ALDH1A1TSHR
SCHEMBL576582 0.69 ALDH1A1 (0.39) ALDH1A1HSD11B1
SCHEMBL25956100 0.69 CYP19A1 (0.45) MGAT2
SCHEMBL6523424 0.68 SIGMAR1 (0.52) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1354887-B1 Ligands for metals and improved metal-catalyzed processes based thereon MASSACHUSETTS INST TECHNOLOGY (US) 2007-04-25 EP disclosed
EP-1097158-B1 LIGANDS FOR METALS AND METAL-CATALYZED PROCESSES MASSACHUSETTS INST TECHNOLOGY (US) 2006-01-25 EP disclosed
EP-1354887-A1 Ligands for metals and improved metal-catalyzed processes based thereon Massachusetts Insitute of Technology (US) 2003-10-22 EP disclosed
EP-1097158-A2 LIGANDS FOR METALS AND METAL-CATALYZED PROCESSES MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2001-05-09 EP disclosed
WO-2000002887-A2 LIGANDS FOR METALS AND METAL-CATALYZED PROCESSES MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2000-01-20 WO disclosed