SCHEMBL560935

SCHEMBL560935

OC(CCC(O)(c1ccccc1)c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.61
CHRM3 P20309 12/20 0.55
CHRM4 P08173 11/20 0.55
CHRM2 P08172 10/20 0.55
CHRM5 P08912 10/20 0.55
CHRM1 P11229 10/20 0.55
CYP2D6 P10635 3/20 0.55
HTR1A P08908 2/20 0.55
OPRM1 P35372 2/20 0.55
KCNH2 Q12809 2/20 0.55
LMNA P02545 2/20 0.55
SIGMAR1 Q99720 2/20 0.53
KDM4E B2RXH2 1/20 0.52
DRD2 P14416 1/20 0.52
DRD1 P21728 1/20 0.52
HTR2A P28223 1/20 0.52
DRD3 P35462 1/20 0.52
SCN1A P35498 1/20 0.52
SCN2A Q99250 1/20 0.52
SCN3A Q9NY46 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4431781 0.89 SIGMAR1 (0.66) SMN1; SMN2CHRM3CHRM4CHRM2CHRM5
SCHEMBL301346 0.87 SMN1; SMN2 (0.55) SMN1; SMN2CHRM3CHRM4CHRM2CHRM5
SCHEMBL11181214 0.85 KIF11 (0.56) SMN1; SMN2CHRM3CHRM4CHRM2CHRM5
SCHEMBL8073736 0.85 SMN1; SMN2 (0.53) SMN1; SMN2CHRM3CHRM4CHRM2CHRM5
SCHEMBL4862217 0.85 SMN1; SMN2 (0.59) SMN1; SMN2CHRM3CHRM4CHRM2CHRM5
SCHEMBL12216176 0.85 SMN1; SMN2 (0.53) SMN1; SMN2CHRM3CHRM4CHRM2CHRM5
SCHEMBL2006125 0.83 CHRM4 (0.56) SMN1; SMN2CHRM3CHRM4CHRM2CHRM5
SCHEMBL28065368 0.83 SMN1; SMN2 (0.52) SMN1; SMN2CHRM3CHRM4CHRM2CHRM5
SCHEMBL5159643 0.81 SIGMAR1 (0.62) SMN1; SMN2CHRM3CHRM4CHRM2CHRM5
SCHEMBL11575079 0.81 KIF11 (0.69) SMN1; SMN2CHRM3CHRM4CHRM2CHRM5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 113 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7417106-B2 Compositions for use in golf balls ACUSHNET COMPANY (US) 2008-08-26 US claimed
US-20070020557-A1 New organic bottom antireflective polymer compositions AZ ELECTRONIC MATERIALS USA CORP. 2007-01-25 US claimed
US-20060014923-A1 COMPOSITIONS FOR USE IN GOLF BALLS ACUSHNET COMPANY (US) 2006-01-19 US claimed
US-20030212291-A1 Diamine curing agents for the preparation of polyurethane-urea elastomers CROMPTON CORPORATION 2003-11-13 US claimed
US-6111129-A SUCH AS 1,3-PROPANEDIOL BIS(4-AMINOBENZOATE), DIRECTLY BY TRANSESTERIFYING AN ALKYL-P-AMINOBENZOATE WITH A DIOL IN THE PRESENCE OF A TRANSESTERIFICATION CATALYST SUCH AS DIBUTYLTIN DILAURATE; USEFUL AS CURING AGENTS FOR POLYUREAURETHANES UNIROYAL CHEMICAL COMPANY, INC. (US) 2000-08-29 US claimed
EP-0579058-B1 Butyl rubber with a bimodal molecular weight distribution BAYER RUBBER INC (CA) 1996-05-29 EP claimed
EP-0579058-A1 Butyl rubber with a bimodal molecular weight distribution BAYER RUBBER INC. (CA) 1994-01-19 EP claimed
US-5194538-A Hydroxy Initiators POLYSAR CORPORATION (CA) 1993-03-16 US claimed
US-11493845-B2 Organic bottom antireflective coating composition for nanolithography ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2022-11-08 US disclosed
US-11092894-B2 Method for forming pattern using anti-reflective coating composition comprising photoacid generator ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2021-08-17 US disclosed
CN-105223774-B Method of forming pattern using anti-reflective coating composition including photoacid generator 罗门哈斯电子材料韩国有限公司 2019-12-20 CN disclosed
US-20160187781-A1 METHOD FOR FORMING PATTERN USING ANTI-REFLECTIVE COATING COMPOSITION COMPRISING PHOTOACID GENERATOR DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2016-06-30 US disclosed
US-20150185614-A1 ORGANIC BOTTOM ANTIREFLECTIVE COATING COMPOSITION FOR NANOLITHOGRAPHY DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2015-07-02 US disclosed
US-8927681-B2 Coating composition for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2015-01-06 US disclosed
US-4175964-A SUCCESSIVE SURFACE TREATMENT WITH AQUEOUS SOLUTIONS OF PHOSPHORIC ACID AND SILICIC ACID OR ITS SALTS FUJI PHOTO FILM CO., LTD. (JP) 1979-11-27 US disclosed
US-4171977-A HEAT RESISTANCE, UNSATURATED MONOMER, PHOTOINITIATOR, CHLORINATED POLYOLEFIN BINDER FUJI PHOTO FILM CO., LTD. (JP) 1979-10-23 US disclosed
US-4058443-A PHOTOPOLYMERIZATION, BINDER, CHLORINATED POLYOLEFIN FUJI PHOTO FILM CO., LTD. (JA) 1977-11-15 US disclosed
US-4058398-A ETHYLENICALLY UNSATURATED MONOMER, POLYVINYL BUTYRAL, HETEROCYCLIC NITROGEN PHOTOINITIATOR FUJI PHOTO FILM CO., LTD. (JA) 1977-11-15 US disclosed
US-4050936-A Image forming process with photopolymer layers between a support and a substrate FUJI PHOTO FILM CO., LTD. (JA) 1977-09-27 US disclosed
US-3932360-A Polyurethane elastomers prepared from diamine curing agents POLAROID CORPORATION (US) 1976-01-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030212291-A1 Diamine curing agents for the preparation of polyurethane-urea elastomers AOC1, DDC, UROD SMN1; SMN2 1424/4885CHRM3 3593/4885CHRM4 3705/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.