Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C9 | P11712 | 2/20 | 0.44 |
| ▸ | USP5 | P45974 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 2/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | RAB9A | P51151 | 2/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | MITF | O75030 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | RXRA | P19793 | 1/20 | 0.37 |
| ▸ | RXRB | P28702 | 1/20 | 0.37 |
| ▸ | TYR | P14679 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4421841 | 0.85 | ELANE (0.43) | HPGDALDH1A1MAPTRXRAKDM4E | |
| SCHEMBL4427237 | 0.84 | CHRNA7 (0.44) | HPGDALDH1A1LMNAMAPTKDM4E | |
| SCHEMBL4985655 | 0.81 | PHLPP2 (0.42) | CYP2C9CYP2D6ALDH1A1MEN1KMT2A | |
| SCHEMBL10384794 | 0.81 | CES2 (0.46) | HPGDCYP2D6SMN1; SMN2ALDH1A1MEN1 | |
| SCHEMBL4425679 | 0.81 | ALDH1A1 (0.34) | CYP2D6HTTSMN1; SMN2ALDH1A1MEN1 | |
| SCHEMBL10947494 | 0.80 | CES2 (0.44) | HPGDALDH1A1RAB9AMAPT | |
| SCHEMBL10945414 | 0.80 | HPGD (0.50) | HPGDHTTALDH1A1LMNARAB9A | |
| SCHEMBL12632153 | 0.80 | CYP2C9 (0.50) | CYP2C9USP5HPGDCYP2D6HIF1A | |
| SCHEMBL58267 | 0.79 | CA2 (0.50) | HPGDHTTSMN1; SMN2ALDH1A1MEN1 | |
| SCHEMBL54909 | 0.79 | CYP2C9 (0.50) | CYP2C9USP5HPGDCYP2D6HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080180503-A1 | INK SET FOR INKJET RECORDING AND INKJET RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2008-07-31 | — | — | US | claimed |
| WO-2025057864-A1 | ORGANIC EL DISPLAY DEVICE, AND METHOD FOR MANUFACTURING SAME | ＴＯＰＰＡＮホールディングス株式会社 | 2025-03-20 | — | — | WO | disclosed |
| US-12210285-B2 | Resin composition, resin sheet, cured film, method for producing cured film, semiconductor device, and display device | TORAY INDUSTRIES, INC. (JP) | 2025-01-28 | — | — | US | disclosed |
| CN-111538209-B | Photosensitive resin composition, organic EL element partition wall, and organic EL element | 日保丽公司 | 2024-05-14 | — | — | CN | disclosed |
| CN-117651722-A | Thiol-containing composition, photocurable composition, and thermosetting composition | 株式会社力森诺科 | 2024-03-05 | — | — | CN | disclosed |
| US-11650499-B2 | Photosensitive resin composition, organic EL element barrier rib, and organic EL element | SHOWA DENKO K.K. (JP) | 2023-05-16 | — | — | US | disclosed |
| US-11599023-B2 | Photosensitive resin composition, organic EL element barrier rib, and organic EL element | SHOWA DENKO K.K. (JP) | 2023-03-07 | — | — | US | disclosed |
| WO-2023003011-A1 | THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION | 昭和電工株式会社 | 2023-01-26 | — | — | WO | disclosed |
| US-11512204-B2 | Squarylium dye and composition containing same | TOYO INK SC HOLDINGS CO., LTD. (JP) | 2022-11-29 | — | — | US | disclosed |
| US-20220275241-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC EL ELEMENT PARTITION WALL | SHOWA DENKO K.K. (JP) | 2022-09-01 | — | — | US | disclosed |
| EP-1958994-A1 | Ink set for inkjet recording and inkjet recording method | FUJIFILM Corporation (JP) | 2008-08-20 | — | — | EP | disclosed |
| US-20080180503-A1 | INK SET FOR INKJET RECORDING AND INKJET RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2008-07-31 | — | — | US | disclosed |
| US-20080139688-A1 | Thiol Compound And Photosensitive Composition Using The Same | SHOWA DENKO K.K. (JP) | 2008-06-12 | — | — | US | disclosed |
| EP-1805137-B1 | THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME | SHOWA DENKO KK (JP) | 2008-03-26 | — | — | EP | disclosed |
| US-7341828-B2 | Thiol compound, photopolymerization initiator composition and photosensitive composition | SHOWA DENKO K.K. (JP) | 2008-03-11 | — | — | US | disclosed |
| EP-1805137-A1 | THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2007-07-11 | — | — | EP | disclosed |
| WO-2006046736-A1 | THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME | SHOWA DENKO K.K. (JP) | 2006-05-04 | — | — | WO | disclosed |
| WO-2006046733-A1 | THIOL COMPOUND, AND PHOTOSENSITIVE COMPOSITION AND BLACK MATRIX RESIST COMPOSITION USING THE COMPOUND | SHOWA DENKO K.K (JP) | 2006-05-04 | — | — | WO | disclosed |
| US-20060036023-A1 | Color filter black matrix resist composition | SHOWA DENKO K.K. (JP) | 2006-02-16 | — | — | US | disclosed |
| US-20050153231-A1 | Thiol compound, photopolymerization initiator composition and photosensitive composition | SHOWA DENKO K.K. (JP) | 2005-07-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080139688-A1 | Thiol Compound And Photosensitive Composition Using The Same | TST, TMT1A, CRY1 | CYP2C9 1087/4885USP5 3880/4885HPGD 3191/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.