SCHEMBL5849477

SCHEMBL5849477

Cc1ccccc1S(=O)(=O)[O-].c1ccc(Sc2ccccc2[S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.35
SIRT1 Q96EB6 1/20 0.33
KDM4E B2RXH2 1/20 0.33
NSD2 O96028 1/20 0.33
MAPT P10636 1/20 0.33
MAPK1 P28482 1/20 0.33
P2RY2 P41231 2/20 0.31
P2RY1 P47900 2/20 0.31
P2RY4 P51582 2/20 0.31
P2RY6 Q15077 2/20 0.31
P2RY12 Q9H244 2/20 0.31
CA12 O43570 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA3 P07451 1/20 0.31
CA4 P22748 1/20 0.31
CA6 P23280 1/20 0.31
CA7 P43166 1/20 0.31
CA9 Q16790 1/20 0.31
CA13 Q8N1Q1 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5849481 0.84 TDP1 (0.39) L3MBTL1KDM4ENSD2MAPTMAPK1
SCHEMBL5849458 0.84 MAPT (0.37) SIRT1KDM4ENSD2MAPTMAPK1
SCHEMBL1703497 0.80 TDP1 (0.37) L3MBTL1KDM4EP2RY2P2RY4TDP1
SCHEMBL5851758 0.79 LIPG (0.35) CA12CA1CA2CA3CA4
Trifluoromethanesulfonic Acid SCHEMBL5850147 0.79 PTGS1 (0.39) L3MBTL1SIRT1KDM4ENSD2MAPT
SCHEMBL298034 0.78 SIRT1 (0.40) L3MBTL1SIRT1KDM4ENSD2MAPT
Hydrochloric Acid SCHEMBL8980364 0.77 SIRT1 (0.39) L3MBTL1SIRT1KDM4ENSD2MAPT
SCHEMBL5849940 0.76 KDM4E (0.32) KDM4ENSD2MAPTMAPK1
SCHEMBL5850131 0.76 HTR6 (0.41) P2RY2P2RY4CA12CA1CA2
SCHEMBL3201612 0.75 SIRT1 (0.40) L3MBTL1SIRT1KDM4ENSD2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6984473-B2 Light blocking; amplified photoresist; acid generators; high density semiconductors MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2006-01-10 US disclosed
US-20030152845-A1 Mask blank, protective film therefor and method of patterning mask blank MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2003-08-14 US disclosed