SCHEMBL5849934

SCHEMBL5849934

CC12CCC(C(S(=O)(=O)[O-])C1=O)C2(C)C.c1ccc(Sc2ccccc2[S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL217323 0.85 ALDH1A1 (0.32)
SCHEMBL4852337 0.83
SCHEMBL5849945 0.82 CNR2 (0.35)
SCHEMBL4480664 0.80 NR1I2 (0.32)
SCHEMBL6339049 0.80 HSD11B1 (0.30)
SCHEMBL384343 0.80 ALDH1A1 (0.34)
SCHEMBL447468 0.79 PTGS2 (0.33)
SCHEMBL483101 0.77 ALDH1A1 (0.30)
SCHEMBL1355252 0.76 ALDH1A1 (0.34)
SCHEMBL449277 0.76 KMT2A (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6984473-B2 Light blocking; amplified photoresist; acid generators; high density semiconductors MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2006-01-10 US disclosed
US-20030152845-A1 Mask blank, protective film therefor and method of patterning mask blank MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2003-08-14 US disclosed