SCHEMBL5849945

SCHEMBL5849945

CC12CCC(C(S(=O)(=O)[O-])C1=O)C2(C)C.COc1ccccc1[S+](c1ccccc1)c1ccccc1

nearest known ligand 0.35

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 2/20 0.35
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL217323 0.87 ALDH1A1 (0.32) CNR2SMN1; SMN2
SCHEMBL4852337 0.84
SCHEMBL5849934 0.82 CYP19A1 (0.30)
SCHEMBL4480664 0.82 NR1I2 (0.32)
SCHEMBL6339049 0.81 HSD11B1 (0.30)
SCHEMBL384343 0.81 ALDH1A1 (0.34) CNR2KMT2A
SCHEMBL447468 0.81 PTGS2 (0.33) CNR2
SCHEMBL384856 0.79
SCHEMBL483101 0.78 ALDH1A1 (0.30) SMN1; SMN2
SCHEMBL449277 0.78 KMT2A (0.32) MEN1KMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6984473-B2 Light blocking; amplified photoresist; acid generators; high density semiconductors MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2006-01-10 US disclosed
US-20030152845-A1 Mask blank, protective film therefor and method of patterning mask blank MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2003-08-14 US disclosed