SCHEMBL5875440

SCHEMBL5875440

CCCCCC=CCC=CCC=CCC=CCCCC(=O)ON1CCNCC1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CNR1 P21554 4/20 0.54
ALDH1A1 P00352 3/20 0.54
MAPT P10636 3/20 0.54
THRB P10828 1/20 0.54
MGLL Q99685 1/20 0.52
FAAH O00519 3/20 0.51
HPGD P15428 2/20 0.51
CNR2 P34972 2/20 0.51
PPARG P37231 2/20 0.50
KDM4E B2RXH2 1/20 0.50
MEN1 O00255 1/20 0.50
USP2 O75604 1/20 0.50
LMNA P02545 1/20 0.50
TP53 P04637 1/20 0.50
CYP3A4 P08684 1/20 0.50
HSPD1 P10809 1/20 0.50
CYP19A1 P11511 1/20 0.50
FABP4 P15090 1/20 0.50
ALOX15 P16050 1/20 0.50
CASP1 P29466 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5874706 0.96 ALDH1A1 (0.51) CNR1ALDH1A1MAPTTHRBMGLL
SCHEMBL5874362 0.92 TERT (0.47) MAPTFAAHCNR2PPARGMEN1
SCHEMBL15737064 0.91 ADORA3 (0.55) CNR1ALDH1A1MAPTTHRBMGLL
SCHEMBL28518217 0.90 MGLL (0.58) CNR1ALDH1A1MAPTTHRBMGLL
SCHEMBL5874554 0.88 ALDH1A1 (0.57) ALDH1A1MAPTHPGDPPARGKDM4E
SCHEMBL5875143 0.86 MGLL (0.55) CNR1ALDH1A1MAPTTHRBMGLL
SCHEMBL28907757 0.86 ALDH1A1 (0.58) ALDH1A1MGLLHPGDPPARGKDM4E
SCHEMBL5874316 0.84 GNAI3 (0.50) MAPTFAAHMEN1LMNAKMT2A
SCHEMBL5874398 0.83 GNAI3 (0.53) MAPTFAAHLMNA
SCHEMBL5874516 0.83 GNAI3 (0.53) MAPTFAAHLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed