SCHEMBL600979

SCHEMBL600979

Cc1ccc(C(F)C(=O)CC(=O)O)cc1

nearest known ligand 0.47

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KEAP1 Q14145 2/20 0.47
NFE2L2 Q16236 2/20 0.47
CNR1 P21554 2/20 0.41
CNR2 P34972 2/20 0.41
LMNA P02545 3/20 0.41
FFAR1 O14842 1/20 0.41
ACHE P22303 1/20 0.40
ALDH1A1 P00352 3/20 0.39
SMN1; SMN2 Q16637 3/20 0.39
KMT2A Q03164 4/20 0.39
MEN1 O00255 2/20 0.39
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39
GAA P10253 1/20 0.38
CYP26A1 O43174 1/20 0.38
SLC1A3 P43003 1/20 0.37
SLC1A2 P43004 1/20 0.37
SLC1A1 P43005 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2399005 0.78 KEAP1 (0.53) KEAP1NFE2L2CNR1CNR2LMNA
SCHEMBL11861772 0.73 KEAP1 (0.45) KEAP1NFE2L2LMNAACHEALDH1A1
SCHEMBL28403042 0.70 CES2 (0.52) KEAP1NFE2L2CNR1CNR2LMNA
SCHEMBL10908214 0.70 FFAR1 (0.54) CNR1CNR2FFAR1ACHEALDH1A1
SCHEMBL7100498 0.69 MMP8 (0.49) LMNAALDH1A1SMN1; SMN2KMT2AMEN1
SCHEMBL7099669 0.69 KMT2A (0.47) ALDH1A1KMT2AMEN1
SCHEMBL7798252 0.69 CHRNA7 (0.41) KEAP1NFE2L2LMNAFFAR1ACHE
SCHEMBL2223571 0.68 FNTA (0.54) LMNAFFAR1ACHEKMT2AMEN1
SCHEMBL13916848 0.68 NPC1 (0.58) LMNAALDH1A1SMN1; SMN2KMT2AMEN1
SCHEMBL4288826 0.68 ALDH1A1 (0.41) KEAP1NFE2L2LMNAACHEALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2012173721-A1 EPOXY FORMULATIONS AND PROCESSES FOR FABRICATION OF OPAQUE STRUCTURES MICROCHEM CORP. (US) 2012-12-20 WO disclosed
US-8163049-B2 Fluoride-modified silica sols for chemical mechanical planarization DUPONT AIR PRODUCTS NANOMATERIALS LLC (US) 2012-04-24 US disclosed
WO-2012021253-A1 EPOXY FORMULATIONS WITH CONTROLLABLE PHOTOSPEED MICROCHEM CORP. (US) 2012-02-16 WO disclosed
US-20120040288-A1 Epoxy formulations with controllable photospeed MICROCHEM CORP. 2012-02-16 US disclosed
US-7691287-B2 Method for immobilizing ligands and organometallic compounds on silica surface, and their application in chemical mechanical planarization DUPONT AIR PRODUCTS NANOMATERIALS LLC (US) 2010-04-06 US disclosed
US-20080182485-A1 Method for immobilizing ligands and organometallic compounds on silica surface, and their application in chemical mechanical planarization VERSUM MATERIALS US, LLC 2008-07-31 US disclosed
EP-1730592-A4 PERMANENT RESIST COMPOSITION, CURED PRODUCT THEREOF, AND USE THEREOF MICROCHEM CORP (US) 2008-03-26 EP disclosed
US-20070251156-A1 Fluoride-modified silica sols for chemical mechanical planarization VERSUM MATERIALS US, LLC 2007-11-01 US disclosed
EP-1730592-A2 PERMANENT RESIST COMPOSITION, CURED PRODUCT THEREOF, AND USE THEREOF MicroChem Corp. (US) 2006-12-13 EP disclosed
US-20050260522-A1 Permanent resist composition, cured product thereof, and use thereof MICROCHEM CORP. 2005-11-24 US disclosed
WO-2005079330-A2 PERMANENT RESIST COMPOSITION, CURED PRODUCT THEREOF, AND USE THEREOF MICROCHEM CORP. (US) 2005-09-01 WO disclosed