Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 6/20 | 0.76 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.76 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.76 |
| ▸ | MEN1 | O00255 | 3/20 | 0.76 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.76 |
| ▸ | HPGD | P15428 | 2/20 | 0.76 |
| ▸ | MAPT | P10636 | 2/20 | 0.76 |
| ▸ | HTT | P42858 | 1/20 | 0.76 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.76 |
| ▸ | NTRK1 | P04629 | 2/20 | 0.59 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.57 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.57 |
| ▸ | ATM | Q13315 | 1/20 | 0.54 |
| ▸ | P2RX4 | Q99571 | 1/20 | 0.54 |
| ▸ | NPC1 | O15118 | 2/20 | 0.53 |
| ▸ | RAB9A | P51151 | 2/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.53 |
| ▸ | ABCG2 | Q9UNQ0 | 1/20 | 0.53 |
| ▸ | MAOA | P21397 | 1/20 | 0.53 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13295998 | 0.90 | L3MBTL1 (0.72) | L3MBTL1KDM4EALDH1A1MEN1KMT2A | |
| SCHEMBL15465959 | 0.86 | L3MBTL1 (1.00) | L3MBTL1KDM4EALDH1A1MEN1KMT2A | |
| SCHEMBL6151617 | 0.84 | L3MBTL1 (0.58) | L3MBTL1KDM4EALDH1A1MEN1KMT2A | |
| SCHEMBL12692736 | 0.84 | ALDH1A1 (0.57) | L3MBTL1KDM4EALDH1A1MEN1KMT2A | |
| SCHEMBL24525575 | 0.84 | P2RX4 (0.58) | L3MBTL1KDM4EALDH1A1MEN1KMT2A | |
| SCHEMBL11382265 | 0.83 | ALDH1A1 (0.68) | L3MBTL1KDM4EALDH1A1MEN1KMT2A | |
| SCHEMBL6152494 | 0.83 | KDM4E (0.58) | L3MBTL1KDM4EALDH1A1MEN1KMT2A | |
| SCHEMBL8086565 | 0.83 | L3MBTL1 (0.56) | L3MBTL1KDM4EALDH1A1MEN1KMT2A | |
| SCHEMBL6151586 | 0.83 | L3MBTL1 (0.56) | L3MBTL1KDM4EALDH1A1MEN1KMT2A | |
| SCHEMBL24155343 | 0.82 | L3MBTL1 (0.52) | L3MBTL1KDM4EALDH1A1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20030044646-A1 | Electroluminescent (EL) devices | XEROX CORPORATION | 2003-03-06 | — | — | US | claimed |
| US-6479172-B2 | PERFORMANCE, THERMOSTABILITY | XEROX CORPORATION | 2002-11-12 | — | — | US | claimed |
| US-20020132134-A1 | Electroluminescent (EL) devices | XEROX CORPORATION | 2002-09-19 | — | — | US | claimed |
| EP-3109703-B1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, AND METHOD FOR FORMING PATTERN USING SAME | TOKYO ELECTRON LTD (JP) | 2020-12-30 | — | — | EP | disclosed |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | TOKYO ELECTRON LIMITED (JP) | 2018-07-17 | — | — | US | disclosed |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | TOKYO ELECTRON LIMITED (JP) | 2018-07-17 | — | — | US | disclosed |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-10 | — | — | US | disclosed |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-10 | — | — | US | disclosed |
| US-9971247-B2 | Pattern-forming method | OSAKA UNIVERSITY (JP) | 2018-05-15 | — | — | US | disclosed |
| US-9971247-B2 | Pattern-forming method | OSAKA UNIVERSITY (JP) | 2018-05-15 | — | — | US | disclosed |
| EP-2597128-B1 | Novel blue emitters for use in organic electroluminescence devices | LG DISPLAY CO LTD (KR) | 2017-07-05 | — | — | EP | disclosed |
| US-20070194692-A1 | Light emitting element and light emitting device having the light emittig element | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2007-08-23 | — | — | US | disclosed |
| US-7169482-B2 | Display device with anthracene and triazine derivatives | LG.PHILIPS LCD CO., LTD. (KR) | 2007-01-30 | — | — | US | disclosed |
| US-7169482-B2 | Display device with anthracene and triazine derivatives | LG.PHILIPS LCD CO., LTD. (KR) | 2007-01-30 | — | — | US | disclosed |
| EP-1580250-A2 | Novel blue emitters for use in organic electroluminescence devices | Xerox Corporation (US) | 2005-09-28 | — | — | EP | disclosed |
| US-20050175857-A1 | Element including fluorescent 1,1'-binaphthyl derivative; uniform luminescence, saturated color; thermal stability; performance; vacuum deposition thin films; enhanced charge transporting, reduced driving voltage | XEROX CORPORATION (US) | 2005-08-11 | — | — | US | disclosed |
| US-6562485-B2 | Electroluminescent (EL) devices | XEROX CORPORATION | 2003-05-13 | — | — | US | disclosed |
| US-20030044646-A1 | Electroluminescent (EL) devices | XEROX CORPORATION | 2003-03-06 | — | — | US | disclosed |
| US-6479172-B2 | PERFORMANCE, THERMOSTABILITY | XEROX CORPORATION | 2002-11-12 | — | — | US | disclosed |
| US-20020132134-A1 | Electroluminescent (EL) devices | XEROX CORPORATION | 2002-09-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | ASIC1, ASIC3, CLTA | L3MBTL1 3448/4885KDM4E 3345/4885ALDH1A1 1963/4885 |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | SLC11A2, XRCC5, RAD54L | L3MBTL1 4063/4885KDM4E 4396/4885ALDH1A1 2183/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.