Known targets — ChEMBL curated mechanism
ABL1BMXBRAFBTKCHRNA4CHRNB2CSNK1EEGFRERBB2F10FLT1FLT3FLT4IGF1RINSRITKJAK3KDRKITOPRM1PARP1PARP2PDGFRBPIK3CDRAF1RETSLC18A2TECTXKdacAdacBdacCftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.61 |
| ▸ | TSHR | P16473 | 3/20 | 0.61 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.61 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.56 |
| ▸ | GAA | P10253 | 1/20 | 0.55 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.55 |
| ▸ | LMNA | P02545 | 3/20 | 0.52 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.52 |
| ▸ | HTT | P42858 | 1/20 | 0.51 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.51 |
| ▸ | POLB | P06746 | 2/20 | 0.50 |
| ▸ | TP53 | P04637 | 2/20 | 0.50 |
| ▸ | NPC1 | O15118 | 2/20 | 0.49 |
| ▸ | RAB9A | P51151 | 2/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.49 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.49 |
| ▸ | HPGD | P15428 | 1/20 | 0.49 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.49 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.48 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Butane SCHEMBL2149677 | 0.94 | ALDH1A1 (0.55) | ALDH1A1TSHRCYP3A4ADORA3GAA | |
| SCHEMBL8999594 | 0.91 | CYP2D6 (0.51) | ALDH1A1TSHRCYP3A4ADORA3GAA | |
| Cyclamic Acid SCHEMBL4613995 | 0.87 | ALDH1A1 (0.67) | ALDH1A1TSHRCYP3A4ADORA3GAA | |
| Cyclohexane SCHEMBL27563472 | 0.84 | GAA (0.54) | ALDH1A1TSHRCYP3A4GAALMNA | |
| Cyclopropane SCHEMBL2101355 | 0.84 | GAA (0.54) | ALDH1A1TSHRCYP3A4GAALMNA | |
| Cyclohexanol SCHEMBL1553521 | 0.83 | ALDH1A1 (0.51) | ALDH1A1TSHRCYP3A4ADORA3GAA | |
| Phosphine SCHEMBL28194487 | 0.82 | GAA (0.52) | ALDH1A1TSHRCYP3A4GAALMNA | |
| SCHEMBL6958251 | 0.81 | ALDH1A1 (0.50) | ALDH1A1TSHRCYP3A4ADORA3GAA | |
| Cyclohexylamine SCHEMBL11787101 | 0.81 | ALDH1A1 (0.50) | ALDH1A1TSHRCYP3A4ADORA3GAA | |
| SCHEMBL4824258 | 0.81 | CYP2D6 (0.51) | ALDH1A1TSHRCYP3A4ADORA3GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 182 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115232185-A | Preparation process of monatibavir | 迪维实验室有限公司 | 2022-10-25 | — | — | CN | disclosed |
| EP-2420891-B1 | Process for immersion lithography | ROHM & HAAS ELECT MAT (US) | 2021-06-23 | — | — | EP | disclosed |
| US-10809616-B2 | Cholate photoacid generators and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-10-20 | — | — | US | disclosed |
| US-10670965-B2 | Polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-06-02 | — | — | US | disclosed |
| US-10558122-B2 | Compositions comprising sulfonamide material and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) | 2020-02-11 | — | — | US | disclosed |
| US-20190346763-A1 | COMPOSITIONS COMPRISING HETERO-SUBSTITUTED CARBOCYCLIC ARYL COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-14 | — | — | US | disclosed |
| US-10474032-B2 | Coating compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-12 | — | — | US | disclosed |
| US-10466588-B2 | Sulfonyl photoacid generators and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-05 | — | — | US | disclosed |
| US-10359698-B2 | Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-07-23 | — | — | US | disclosed |
| EP-1720072-B1 | Compositons and processes for immersion lithography | ROHM & HAAS ELECT MAT (US) | 2019-06-05 | — | — | EP | disclosed |
| US-20030013049-A1 | Photoacid generator systems for short wavelength imaging | SHIPLEY COMPANY, L.L.C. | 2003-01-16 | — | — | US | disclosed |
| US-6482567-B1 | Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same | SHIPLEY COMPANY, L.L.C. | 2002-11-19 | — | — | US | disclosed |
| US-6458506-B2 | GENERATING ANTHRACENE ACID UPON EXPOSURE TO ACTIVATING RADIATION | SHIPLEY COMPANY, LLC | 2002-10-01 | — | — | US | disclosed |
| US-20020051932-A1 | Photoresists for imaging with high energy radiation | SHIPLEY COMPANY, L.L.C. | 2002-05-02 | — | — | US | disclosed |
| US-20020009663-A1 | Photoacid generators and photoresists comprising same | SHIPLEY COMPANY, L.L.C. | 2002-01-24 | — | — | US | disclosed |
| US-20020001770-A1 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. | 2002-01-03 | — | — | US | disclosed |
| US-6048672-A | RELIEF IMAGES ON SUBSTRATES WITH TITANIUM NITRIDE SURFACES, HEATING, COATING, EXPOSURE AND DEVELOPMENT | SHIPLEY COMPANY, L.L.C. (US) | 2000-04-11 | — | — | US | disclosed |
| US-6037107-A | EXPOSING TO ACTIVATION RADIATION A POSITIVE WORKING PHOTORESIST COMPRISING AN ALKALI SOLUBLE RESIN SUBSTITUTED WITH AN ACID LABILE BLOCKING GROUP TO GENERATE HALOGENATED SULFONIC ACID BY PHOTOLYSIS | SHIPLEY COMPANY, L.L.C. (US) | 2000-03-14 | — | — | US | disclosed |
| EP-0938029-A2 | Methods using photoresist compositions and articles produced therewith | Shipley Company LLC (US) | 1999-08-25 | — | — | EP | disclosed |
| EP-0498268-A2 | 5-Oxo-L-proline derivatives and pharmaceutical use thereof | POLI INDUSTRIA CHIMICA S.p.A. (IT) | 1992-08-12 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10809616-B2 | Cholate photoacid generators and photoresists comprising same | GGCT, LCAT, SLC7A11 | ALDH1A1 1769/4885TSHR 3268/4885CYP3A4 535/4885 |
| US-20020009663-A1 | Photoacid generators and photoresists comprising same | GSS, TST, SQOR | ALDH1A1 350/4885TSHR 4274/4885CYP3A4 1732/4885 |
| US-10466588-B2 | Sulfonyl photoacid generators and photoresists comprising same | GSS, GLUL, GLP1R | ALDH1A1 1534/4885TSHR 934/4885CYP3A4 1326/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.